Search Results - "Bailey, Todd C" :: K.UTB vyhledávací portál | TBU Library Retrieval Portal

Japanese holdouts of World War Two: Honor, culture or self-preservation

Japanese holdouts of World War Two: Honor, culture or self-preservation

by Bailey, Todd C
Year of Publication 01.01.2014

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Dissertation

Process-metrology reproducibility bands for lithographic photomasks

Process-metrology reproducibility bands for lithographic photomasks

by Miller, Marshal A, Halle, Scott D, Bailey, Todd C, Graur, Ioana C
Year of Publication 19.02.2019

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Patent

System and method for semiconductor device fabrication using modeling

System and method for semiconductor device fabrication using modeling

by SARMA CHANDRASEKHAR, BAILEY TODD C
Year of Publication 22.01.2013

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Patent

System and Method for Semiconductor Device Fabrication Using Modeling

System and Method for Semiconductor Device Fabrication Using Modeling

by SARMA CHANDRASEKHAR, BAILEY TODD C
Year of Publication 12.07.2012

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Patent

PROCESS-METROLOGY REPRODUCIBILITY BANDS FOR LITHOGRAPHIC PHOTOMASKS

PROCESS-METROLOGY REPRODUCIBILITY BANDS FOR LITHOGRAPHIC PHOTOMASKS

by Bailey Todd C, Halle Scott D, Miller Marshal A, Graur Ioana C
Year of Publication 12.04.2018

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Patent

Process-metrology reproducibility bands for lithographic photomasks

Process-metrology reproducibility bands for lithographic photomasks

by Bailey Todd C, Halle Scott D, Miller Marshal A, Graur Ioana C
Year of Publication 27.03.2018

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Patent

Alignment method for semiconductor processing

Alignment method for semiconductor processing

by CHU WILLIAM, BAILEY TODD C, MUTH WILLIAM
Year of Publication 20.08.2013

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Patent

PROCESS-METROLOGY REPRODUCIBILITY BANDS FOR LITHOGRAPHIC PHOTOMASKS

PROCESS-METROLOGY REPRODUCIBILITY BANDS FOR LITHOGRAPHIC PHOTOMASKS

by Bailey Todd C, Halle Scott D, Miller Marshal A, Graur Ioana C
Year of Publication 29.09.2016

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Patent

SYSTEM AND METHOD FOR WIRELESS IP ADDRESS CAPACITY OPTIMIZATION

SYSTEM AND METHOD FOR WIRELESS IP ADDRESS CAPACITY OPTIMIZATION

by BAILEY TODD C
Year of Publication 13.07.2006

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Patent

ALIGNMENT METHOD FOR SEMICONDUCTOR PROCESSING

ALIGNMENT METHOD FOR SEMICONDUCTOR PROCESSING

by CHU WILLIAM, BAILEY TODD C, MUTH WILLIAM
Year of Publication 05.05.2011

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Patent

Pattern recognition with edge correction for design based metrology

Pattern recognition with edge correction for design based metrology

by FISCHER DANIEL S, SHAO DONGBING, BAILEY TODD C
Year of Publication 23.07.2013

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Patent

Pattern recognition with edge correction for design based metrology

Pattern recognition with edge correction for design based metrology

by FISCHER DANIEL S, SHAO DONGBING, BAILEY TODD C
Year of Publication 23.04.2013

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Patent

Stray light feedback for dose control in semiconductor lithography systems

Stray light feedback for dose control in semiconductor lithography systems

by LI WAI-KIN, MAROKKEY SAJAN, BAILEY TODD C
Year of Publication 11.12.2012

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Patent

Stray light feedback for dose control in semiconductor lithography systems

Stray light feedback for dose control in semiconductor lithography systems

by Marokkey, Sajan, Li, Wai-Kin, Bailey, Todd C
Year of Publication 11.12.2012

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Patent

Method of automatic fluid dispensing for imprint lithography processes

Method of automatic fluid dispensing for imprint lithography processes

by COLBURN MATTHERW E, WILLSON CARLTON GRANT, EKERDT JOHN G, BAILEY TODD C, CHOI BYUNG-JIN, SREENIVASAN SIDLGATA V
Year of Publication 29.12.2015

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Patent

PATTERN RECOGNITION WITH EDGE CORRECTION FOR DESIGN BASED METROLOGY

PATTERN RECOGNITION WITH EDGE CORRECTION FOR DESIGN BASED METROLOGY

by FISCHER DANIEL S, SHAO DONGBING, BAILEY TODD C
Year of Publication 03.05.2012

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Patent

Pattern Recognition with Edge Correction for Design Based Metrology

Pattern Recognition with Edge Correction for Design Based Metrology

by FISCHER DANIEL S, SHAO DONGBING, BAILEY TODD C
Year of Publication 03.05.2012

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Patent

IMPRINT LITHOGRAPHY TEMPLATES HAVING ALIGNMENT MARKS

IMPRINT LITHOGRAPHY TEMPLATES HAVING ALIGNMENT MARKS

by STEPHEN C. JOHNSON, BRITAIN J. SMITH, JOHN G. EKERDT, MATTHEW E. COLBURN, BYUNG-JIN CHOI, TODD C. BAILEY, CARLTON G. WILLSON, SIDLGATA V. SREENIVASAN
Year of Publication 30.06.2015

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Patent

Stray Light Feedback for Dose Control in Semiconductor Lithography Systems

Stray Light Feedback for Dose Control in Semiconductor Lithography Systems

by LI WAI-KIN, MAROKKEY SAJAN, BAILEY TODD C
Year of Publication 19.11.2009

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Patent

Stray light feedback for dose control in semiconductor lithography systems

Stray light feedback for dose control in semiconductor lithography systems

by Marokkey, Sajan, Li, Wai-Kin, Bailey, Todd C
Year of Publication 01.09.2009

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Patent