CMOS-compatible manufacturability of sub-15 nm Si/SiO 2 /Si nanopillars containing single Si nanodots for single electron transistor applications
von Borany, J, Engelmann, H-J, Heinig, K-H, Amat, E, Hlawacek, G, Klüpfel, F, Hübner, R, Möller, W, Pourteau, M-L, Rademaker, G, Rommel, M, Baier, L, Pichler, P, Perez-Murano, F, Tiron, R
Published in Semiconductor science and technology (01.05.2023)
Published in Semiconductor science and technology (01.05.2023)
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Correlating Optical Microspectroscopy with 4×4 Transfer Matrix Modeling for Characterizing Birefringent Van der Waals Materials
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Published in Small methods (01.10.2023)
Published in Small methods (01.10.2023)
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Sub-20 nm multilayer nanopillar patterning for hybrid SET/CMOS integration
Pourteau, M.-L., Gharbi, A., Brianceau, P., Dallery, J.-A., Laulagnet, F., Rademaker, G., Tiron, R., Engelmann, H.-J., von Borany, J., Heinig, K.-H., Rommel, M., Baier, L.
Published in Micro and Nano Engineering (01.11.2020)
Published in Micro and Nano Engineering (01.11.2020)
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