Atomic layer deposition of hafnium oxide on germanium substrates
Delabie, Annelies, Puurunen, Riikka L., Brijs, Bert, Caymax, Matty, Conard, Thierry, Onsia, Bart, Richard, Olivier, Vandervorst, Wilfried, Zhao, Chao, Heyns, Marc M., Meuris, Marc, Viitanen, Minna M., Brongersma, Hidde H., de Ridder, Marco, Goncharova, Lyudmila V., Garfunkel, Eric, Gustafsson, Torgny, Tsai, Wilman
Published in Journal of applied physics (15.03.2005)
Published in Journal of applied physics (15.03.2005)
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Journal Article
Grazing Incidence-X-ray Fluorescence Spectrometry for the Compositional Analysis of Nanometer-Thin High- κDielectric HfO2 Layers
HELLIN, David, DELABIE, Annelies, PUURUNEN, Riikka L., BEAVEN, Peter, CONARD, Thierry, BRIJS, Bert, GENDT, Stefan De, VINCKIER, Chris
Published in Analytical Sciences (2005)
Published in Analytical Sciences (2005)
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Journal Article
Scaling to Sub-1 nm Equivalent Oxide Thickness with Hafnium Oxide Deposited by Atomic Layer Deposition
Delabie, Annelies, Caymax, Matty, Brijs, Bert, Brunco, David P., Conard, Thierry, Sleeckx, Erik, Van Elshocht, Sven, Ragnarsson, Lars-Åke, De Gendt, Stefan, Heyns, Marc M.
Published in Journal of the Electrochemical Society (01.01.2006)
Published in Journal of the Electrochemical Society (01.01.2006)
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Journal Article
NiO Thin Films Synthesized by Atomic Layer Deposition using Ni(dmamb)2 and Ozone as Precursors
Antony Premkumar, Peter, Toeller, Michael, Adelmann, Christoph, Meersschaut, Johan, Franquet, Alexis, Richard, Olivier, Tielens, Hilde, Brijs, Bert, Moussa, Alain, Conard, Thierry, Bender, Hugo, Schaekers, Marc, Kittl, Jorge A., Jurczak, Malgorzata, Van Elshocht, Sven
Published in Chemical vapor deposition (01.03.2012)
Published in Chemical vapor deposition (01.03.2012)
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Journal Article
A comparative study of the microstructure-dielectric properties of crystalline SrTiO3 ALD films obtained via seed layer approach
Popovici, Mihaela, Tomida, Kazuyuki, Swerts, Johan, Favia, Paola, Delabie, Annelies, Bender, Hugo, Adelmann, Christoph, Tielens, Hilde, Brijs, Bert, Kaczer, Ben, Pawlak, Malgorzata A., Kim, Min-Soo, Altimime, Laith, Van Elshocht, Sven, Kittl, Jorge A.
Published in Physica status solidi. A, Applications and materials science (01.08.2011)
Published in Physica status solidi. A, Applications and materials science (01.08.2011)
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Journal Article
A comparative study of the microstructure–dielectric properties of crystalline SrTiO 3 ALD films obtained via seed layer approach
Popovici, Mihaela, Tomida, Kazuyuki, Swerts, Johan, Favia, Paola, Delabie, Annelies, Bender, Hugo, Adelmann, Christoph, Tielens, Hilde, Brijs, Bert, Kaczer, Ben, Pawlak, Malgorzata A., Kim, Min‐Soo, Altimime, Laith, Van Elshocht, Sven, Kittl, Jorge A.
Published in Physica status solidi. A, Applications and materials science (01.08.2011)
Published in Physica status solidi. A, Applications and materials science (01.08.2011)
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Journal Article
As-deposited superconducting thin films by electron cyclotron resonance-assisted laser ablation for application in micro-electronics
DENEFFE, K, VAN MIEGHEM, P, BRIJS, B, VANDERVORST, W, MERTENS, R, BORGHS, G
Published in Japanese Journal of Applied Physics (01.09.1991)
Published in Japanese Journal of Applied Physics (01.09.1991)
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Journal Article
Atomic Layer Deposition of Gadolinium Aluminate using Gd(iPrCp)3, TMA, and O3 or H2O
Adelmann, Christoph, Pierreux, Dieter, Swerts, Johan, Dewulf, Daan, Hardy, An, Tielens, Hilde, Franquet, Alexis, Brijs, Bert, Moussa, Alain, Conard, Thierry, Van Bael, Marlies K., Maes, Jan W., Jurczak, Malgorzata, Kittl, Jorge A., Van Elshocht, Sven
Published in Chemical vapor deposition (01.06.2010)
Published in Chemical vapor deposition (01.06.2010)
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Journal Article
SiGe SEG Growth for Buried Channels p-MOS Devices
Hikavyy, Andriy, Loo, Roger, Witters, Liesbeth, Takeoka, Shinji, Geypen, Jef, Brijs, Bert, Merckling, Clement, Caymax, Matty, Dekoster, Johan
Published in ECS transactions (25.09.2009)
Published in ECS transactions (25.09.2009)
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Journal Article
Ni fully silicided gates for 45 nm CMOS applications
Kittl, Jorge A., Lauwers, Anne, Pawlak, Malgorzata A., van Dal, Mark J.H., Veloso, Anabela, Anil, K.G., Pourtois, Geoffrey, Demeurisse, Caroline, Schram, Tom, Brijs, Bert, de Potter, Muriel, Vrancken, Christa, Maex, Karen
Published in Microelectronic engineering (01.12.2005)
Published in Microelectronic engineering (01.12.2005)
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Journal Article
Conference Proceeding
Growth of Dysprosium-, Scandium-, and Hafnium-based Third Generation High-κ Dielectrics by Atomic Vapor Deposition
Adelmann, C., Lehnen, P., Van Elshocht, S., Zhao, C., Brijs, B., Franquet, A., Conard, T., Roeckerath, M., Schubert, J., Boissière, O., Lohe, C., De Gendt, S.
Published in Chemical vapor deposition (01.10.2007)
Published in Chemical vapor deposition (01.10.2007)
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Journal Article
Atomic Layer Deposition of Gadolinium Aluminate using Gd( i PrCp) 3 , TMA, and O 3 or H 2 O
Adelmann, Christoph, Pierreux, Dieter, Swerts, Johan, Dewulf, Daan, Hardy, An, Tielens, Hilde, Franquet, Alexis, Brijs, Bert, Moussa, Alain, Conard, Thierry, Van Bael, Marlies K., Maes, Jan W., Jurczak, Malgorzata, Kittl, Jorge A., Van Elshocht, Sven
Published in Chemical vapor deposition (01.06.2010)
Published in Chemical vapor deposition (01.06.2010)
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Journal Article
Metal-Organic Chemical Vapor Deposition of Ti-Doped NiO Layers for Application in Resistive Switching Memories
Meersschaut, J., Toeller, M., Schaekers, Marc, Wang, X.P., Brijs, Bert, Wouters, Dirk J., Jurczak, Malgorzata, Altamime, L., Van Elshocht, S., Vancoille, E.
Published in ECS transactions (01.10.2010)
Published in ECS transactions (01.10.2010)
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Journal Article
(Invited) Introducing Lanthanide Aluminates as Dielectrics for Nonvolatile Memory Applications: A Material Scientist's View
Adelmann, Christoph, Swerts, Johan, Richard, Olivier, Conard, Thierry, Popovici, Mihaela, Afanas'ev, Valeri V., Breuil, Laurent, Cacciato, Antonio, Opsomer, Karl, Brijs, Bert, Tielens, Hilde, Pourtois, Geoffrey, Bender, Hugo, Detavernier, Christophe, Jurczak, Malgorzata, Van Elshocht, S., Kittl, Jorge A.
Published in ECS transactions (01.10.2010)
Published in ECS transactions (01.10.2010)
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Journal Article
New low-stress PECVD poly-SiGe Layers for MEMS
Rusu, C., Sedky, S., Parmentier, B., Verbist, A., Richard, O., Brijs, B., Geenen, L., Witvrouw, A., Larmer, F., Fischer, F., Kronmuller, S., Leca, V., Otter, B.
Published in Journal of microelectromechanical systems (01.12.2003)
Published in Journal of microelectromechanical systems (01.12.2003)
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Journal Article
Atomic-Layer Deposition of Lutetium Aluminate Thin Films for Non-Volatile Memory Applications
Adelmann, Christoph, Swerts, Johan, Conard, Thierry, Brijs, Bert, Franquet, Alexis, Hardy, An, Tielens, Hilde, Opsomer, Karl, Moussa, Alain, Van Bael, Marlies K., Jurczak, Malgorzata, Kittl, Jorge A., Van Elshocht, Sven
Published in ECS transactions (01.01.2011)
Published in ECS transactions (01.01.2011)
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Journal Article
Bulk properties of MOCVD-deposited HfO2 layers for high k dielectric applications
VAN ELSHOCHT, Sven, BAKLANOV, Mikhail, DE GENDT, Stefan, KLUTH, Jon, PIQUE, Didier, RICHARD, Olivier, VANHAEREN, Danielle, VEREECKE, Guy, WITTERS, Thomas, ZHAO, Chao, HEYNS, Marc, BRIJS, Bert, CARTER, Richard, CAYMAX, Matty, CARBONELL, Laureen, CLAES, Martine, CONARD, Thierry, COSNIER, Vincent, DATE, Lucien
Published in Journal of the Electrochemical Society (2004)
Published in Journal of the Electrochemical Society (2004)
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Journal Article
(Invited) Rare Earth Materials for Semiconductor Applications
Van Elshocht, Sven, Adelmann, Christoph, Popovici, Mihaela, Swerts, Johan, Delabie, Annelies, Nyns, Laura, Shi, Xiaoping, Tielens, Hilde, Brijs, Bert, Pourtois, Geoffrey, Schram, Tom, Pierreux, Dieter, Maes, Jan-Willem, Hardy, An, Van Bael, Marlies K., Kittl, Jorge A.
Published in ECS transactions (01.01.2010)
Published in ECS transactions (01.01.2010)
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Journal Article
Growth Studies and Reaction Mechanism of the Atomic Layer Deposition of Hafnium Oxide
Delabie, Annelies, Caymax, Matty, Brijs, Bert, Brunco, David, Conard, Thierry, Sleeckx, Erik, Ragnarsson, Lars-Ake, Van Elshocht, Sven, De Gendt, Stefan, Heyns, Marc
Published in ECS transactions (07.07.2006)
Published in ECS transactions (07.07.2006)
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Journal Article
Grazing Incidence-X-ray Fluorescence Spectrometry for the Compositional Analysis of Nanometer-Thin High- [kappa]Dielectric HfO2 Layers
HELLIN, David, DELABIE, Annelies, L. PUURUNEN, Riikka, BEAVEN, Peter, CONARD, Thierry, BRIJS, Bert, De GENDT, Stefan, VINCKIER, Chris
Published in Analytical sciences (01.07.2005)
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Published in Analytical sciences (01.07.2005)
Journal Article