Highly vibrationally excited O2 molecules in low-pressure inductively-coupled plasmas detected by high sensitivity ultra-broad-band optical absorption spectroscopy
Foucher, Mickaël, Marinov, Daniil, Carbone, Emile, Chabert, Pascal, Booth, Jean-Paul
Published in Plasma sources science & technology (01.08.2015)
Published in Plasma sources science & technology (01.08.2015)
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Rogue Archives: Digital Cultural Memory and Media Fandom by Abigail De Kosnik (review)
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Book Review
Global (volume-averaged) model of inductively coupled chlorine plasma: Influence of Cl wall recombination and external heating on continuous and pulse-modulated plasmas
Kemaneci, Efe, Carbone, Emile, Booth, Jean-Paul, Graef, Wouter, van Dijk, Jan, Kroesen, Gerrit
Published in Plasma sources science & technology (01.08.2014)
Published in Plasma sources science & technology (01.08.2014)
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Journal Article
QDB: a new database of plasma chemistries and reactions
Tennyson, Jonathan, Rahimi, Sara, Hill, Christian, Tse, Lisa, Vibhakar, Anuradha, Akello-Egwel, Dolica, Brown, Daniel B, Dzarasova, Anna, Hamilton, James R, Jaksch, Dagmar, Mohr, Sebastian, Wren-Little, Keir, Bruckmeier, Johannes, Agarwal, Ankur, Bartschat, Klaus, Bogaerts, Annemie, Booth, Jean-Paul, Goeckner, Matthew J, Hassouni, Khaled, Itikawa, Yukikazu, Braams, Bastiaan J, Krishnakumar, E, Laricchiuta, Annarita, Mason, Nigel J, Pandey, Sumeet, Petrovic, Zoran Lj, Pu, Yi-Kang, Ranjan, Alok, Rauf, Shahid, Schulze, Julian, Turner, Miles M, Ventzek, Peter, Whitehead, J Christopher, Yoon, Jung-Sik
Published in Plasma sources science & technology (04.04.2017)
Published in Plasma sources science & technology (04.04.2017)
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Tailored Voltage Waveform Deposition of Microcrystalline Silicon Thin Films from Hydrogen-Diluted Silane and Silicon Tetrafluoride: Optoelectronic Properties of Films
Johnson, Erik V., Pouliquen, Sylvain, Delattre, Pierre-Alexandre, Booth, Jean-Paul
Published in Japanese Journal of Applied Physics (01.08.2012)
Published in Japanese Journal of Applied Physics (01.08.2012)
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