Chemical mechanical polishing system
BOO, JAE-PHIL, KIM, DONG-SOO, SEO, KEON-SIK, JEON, CHAN-WOON, BAN, JUN-HO, GOO, JAUL
Year of Publication 16.12.2011
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Year of Publication 16.12.2011
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Conditioner of chemical mechanical polishing apparatus and conditioning method
BAN JUN-HO, JEON CHAN-WOON, BOO JAE-PHIL, KIM DONG-SOO, GOO JAUL, SEO KEON-SIK
Year of Publication 16.11.2011
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Year of Publication 16.11.2011
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Slurry for chemical mechanical polishing process and method of manufacturing semiconductor device using the same
Park, Young-Rae, Kim, Jung-Yup, Yoon, Bo-Un, Kim, Kwang-Bok, Boo, Jae-Phil, Lee, Jong-Won, Hah, Sang-Rok, Kim, Kyung-Hyun, Hong, Chang-Ki
Year of Publication 19.02.2004
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Year of Publication 19.02.2004
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Slurry for chemical mechanical polishing process and method of manufacturing semiconductor device using the same
Park, Young-rae, Kim, Jung-yup, Yoon, Bo-un, Kim, Kwang-bok, Boo, Jae-phil, Lee, Jong-won, Hah, Sang-rok, Kim, Kyung-hyun, Hong, Chang-ki
Year of Publication 30.09.2003
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Year of Publication 30.09.2003
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Chemical mechanical polishing system, method and system
JEON CHAN WOON, SEO KEON SIK, BAN JUN HO, GOO JA CHEUL, BOO JAE PHIL, KIM DONG SOO
Year of Publication 09.11.2011
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Year of Publication 09.11.2011
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Slurry for chemical mechanical polishing process and method of manufacturing semiconductor device using the same
Park, Young-rae, Kim, Jung-yup, Yoon, Bo-un, Kim, Kwang-bok, Boo, Jae-phil, Lee, Jong-won, Hah, Sang-rok, Kim, Kyung-hyun, Hong, Chang-ki
Year of Publication 21.03.2002
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Year of Publication 21.03.2002
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Vorrichtung und ein Verfahren zum Behandeln von Substraten
BOO, JAE-PHIL, SUNG, JUNG-HWAN, JUNG, KI-HONG, KANG, JONG-MUK, SEO, KEON-SIK, CHO, CHAN-WOO, KIM, IK-JOO, KIM, MYUNG-SEOK
Year of Publication 05.08.2010
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Year of Publication 05.08.2010
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Slurry used for the chemical-mechanical polishing of semiconductor components comprises water, grinding grains and a polymer additive having hydrophilic as well as hydrophobic groups
PARK, YOUNG-RAE, BOO, JAE-PHIL, HONG, CHANG-KI, YOON, BO-UN, KIM, KWANG-BOK, KIM, JUNG-YUP, LEE, JONG-WON, KIM, KYUNG-HYUN, HAH, SANG-ROK
Year of Publication 06.12.2001
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Year of Publication 06.12.2001
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Vorrichtung zum Polieren eines Wafers
KIM, JONG SOO, LEE, SUN WUNG, RYU, JUN GYU, BOO, JAE PHIL, LEE, SANG SEON
Year of Publication 18.05.2006
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Year of Publication 18.05.2006
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