Search Results - "BLATCHFORD JAMES WALTER" :: K.UTB vyhledávací portál

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SRAM layout for double patterning

by Blatchford, James Walter
Year of Publication 30.04.2024

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Patent

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SRAM LAYOUT FOR DOUBLE PATTERNING

by Blatchford, James Walter
Year of Publication 28.01.2021

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SRAM layout for double patterning

by Blatchford, James Walter
Year of Publication 17.11.2020

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Patent

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Rectangular via for ensuring via yield in the absence of via redundancy

by Blatchford, James Walter
Year of Publication 11.08.2020

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SRAM LAYOUT FOR DOUBLE PATTERNING

by Blatchford, James Walter
Year of Publication 11.04.2019

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SRAM layout for double patterning

by Blatchford, James Walter
Year of Publication 15.01.2019

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SRAM layout for double patterning

by Blatchford, James Walter
Year of Publication 16.10.2018

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Patent

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SRAM LAYOUT FOR DOUBLE PATTERNING

by BLATCHFORD JAMES WALTER
Year of Publication 21.01.2016

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Patent

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Method for ensuring DPT compliance for auto-routed via layers

by BLATCHFORD JAMES WALTER
Year of Publication 18.08.2015

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Patent

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FORMING SILICIDE AND CONTACT AT EMBEDDED EPITAXIAL FACET

by BLATCHFORD, James, Walter, EKBOTE, Shashank, S, LIM, Kwan-Yong, CHOI, Younsung
Year of Publication 03.08.2022

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Patent

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Metal on elongated contacts

by Blatchford, James Walter, Jessen, Scott William
Year of Publication 16.10.2018

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Patent

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Elongated contacts using litho-freeze-litho-etch process

by Blatchford, James Walter, Jessen, Scott William
Year of Publication 07.08.2018

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Method to ensure double patterning technology compliance in standard cells

by BLATCHFORD JAMES WALTER
Year of Publication 17.06.2014

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Method for generating ultra-short-run-length dummy poly features

by BLATCHFORD JAMES WALTER
Year of Publication 10.06.2014

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Perturbational technique for co-optimizing design rules and illumination conditions for lithography process

by BLATCHFORD JAMES WALTER
Year of Publication 03.06.2014

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Patent

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Method of forming a transistor with an active area layout having both wide and narrow area portions and a gate formed over the intersection of the two

by Aton Thomas J, Blatchford James Walter
Year of Publication 20.02.2018

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Patent

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Method for ensuring DPT compliance with autorouted metal layers

by BLATCHFORD JAMES WALTER
Year of Publication 22.04.2014

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Patent

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PERTURBATIONAL TECHNIQUE FOR CO-OPTIMIZING DESIGN RULES AND ILLUMINATION CONDITIONS FOR LITHOGRAPHY PROCESS

by BLATCHFORD JAMES WALTER
Year of Publication 10.04.2014

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Patent

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Perturbational technique for co-optimizing design rules and illumination conditions for lithography process

by BLATCHFORD JAMES WALTER
Year of Publication 10.12.2013

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Dual alignment strategy for optimizing contact layer alignment

by BLATCHFORD JAMES WALTER
Year of Publication 10.12.2013

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Patent

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