Superconducting properties of very high quality NbN thin films grown by high temperature chemical vapor deposition
Hazra, D, Tsavdaris, N, Jebari, S, Grimm, A, Blanchet, F, Mercier, F, Blanquet, E, Chapelier, C, Hofheinz, M
Published in Superconductor science & technology (01.10.2016)
Published in Superconductor science & technology (01.10.2016)
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Journal Article
Preferential orientation of fluorine-doped SnO2 thin films: The effects of growth temperature
Consonni, V., Rey, G., Roussel, H., Doisneau, B., Blanquet, E., Bellet, D.
Published in Acta materialia (01.01.2013)
Published in Acta materialia (01.01.2013)
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Journal Article
Aluminum nitride thin films deposited by hydrogen plasma enhanced and thermal atomic layer deposition
Tian, L., Ponton, S., Benz, M., Crisci, A., Reboud, R., Giusti, G., Volpi, F., Rapenne, L., Vallée, C., Pons, M., Mantoux, A., Jiménez, C., Blanquet, E.
Published in Surface & coatings technology (15.08.2018)
Published in Surface & coatings technology (15.08.2018)
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Journal Article
Coupling powder bed additive manufacturing and vapor phase deposition methods for elaboration of coated 3D Ti-6Al-4V architectures with enhanced surface properties
Moll, A., Blandin, J.-J., Dendievel, R., Gicquel, E., Pons, M., Jimenez, C., Blanquet, E., Mercier, F.
Published in Surface & coatings technology (15.06.2021)
Published in Surface & coatings technology (15.06.2021)
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Journal Article
Prediction of dislocation density in AlN or GaN films deposited on (0001) sapphire
Lay, S., Mercier, F., Boichot, R., Giusti, G., Pons, M., Blanquet, E.
Published in Journal of materials science (01.08.2020)
Published in Journal of materials science (01.08.2020)
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Journal Article
Evolution of Crystal Structure During the Initial Stages of ZnO Atomic Layer Deposition
Boichot, R, Tian, L, Richard, M.-I, Crisci, A, Chaker, A, Cantelli, V, Coindeau, S, Lay, S, Ouled, T, Guichet, C, Chu, M. H, Aubert, N, Ciatto, G, Blanquet, E, Thomas, O, Deschanvres, J.-L, Fong, D. D, Renevier, H
Published in Chemistry of materials (26.01.2016)
Published in Chemistry of materials (26.01.2016)
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Journal Article
Influence of the V/III ratio in the gas phase on thin epitaxial AlN layers grown on (0001) sapphire by high temperature hydride vapor phase epitaxy
Claudel, A., Fellmann, V., Gélard, I., Coudurier, N., Sauvage, D., Balaji, M., Blanquet, E., Boichot, R., Beutier, G., Coindeau, S., Pierret, A., Attal-Trétout, B., Luca, S., Crisci, A., Baskar, K., Pons, M.
Published in Thin solid films (01.12.2014)
Published in Thin solid films (01.12.2014)
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Journal Article
Analysis of the iodine gas phase produced by interaction of CsI and MoO3 vapours in flowing steam
Gouello, M., Mutelle, H., Cousin, F., Sobanska, S., Blanquet, E.
Published in Nuclear engineering and design (01.10.2013)
Published in Nuclear engineering and design (01.10.2013)
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Journal Article
Effects of AlN nucleation layers on the growth of AlN films using high temperature hydride vapor phase epitaxy
Balaji, M., Claudel, A., Fellmann, V., Gélard, I., Blanquet, E., Boichot, R., Pierret, A., Attal-Trétout, B., Crisci, A., Coindeau, S., Roussel, H., Pique, D., Baskar, K., Pons, M.
Published in Journal of alloys and compounds (15.06.2012)
Published in Journal of alloys and compounds (15.06.2012)
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Journal Article
Epitaxial growth of AlN on c-plane sapphire by High Temperature Hydride Vapor Phase Epitaxy: Influence of the gas phase N/Al ratio and low temperature protective layer
Boichot, R., Coudurier, N., Mercier, F., Lay, S., Crisci, A., Coindeau, S., Claudel, A., Blanquet, E., Pons, M.
Published in Surface & coatings technology (25.12.2013)
Published in Surface & coatings technology (25.12.2013)
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Journal Article
HVPE of aluminum nitride, film evaluation and multiscale modeling of the growth process
Pons, M., Su, J., Chubarov, M., Boichot, R., Mercier, F., Blanquet, E., Giusti, G., Pique, D.
Published in Journal of crystal growth (15.06.2017)
Published in Journal of crystal growth (15.06.2017)
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Journal Article
High temperature chemical vapor deposition of aluminum nitride, growth and evaluation
Pons, M., Boichot, R., Coudurier, N., Claudel, A., Blanquet, E., Lay, S., Mercier, F., Pique, D.
Published in Surface & coatings technology (15.09.2013)
Published in Surface & coatings technology (15.09.2013)
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Journal Article
Conference Proceeding
Epitaxial and polycrystalline growth of AlN by high temperature CVD: Experimental results and simulation
Boichot, R., Claudel, A., Baccar, N., Milet, A., Blanquet, E., Pons, M.
Published in Surface & coatings technology (25.11.2010)
Published in Surface & coatings technology (25.11.2010)
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Journal Article
Conference Proceeding
Atomic layer deposition of tantalum oxide thin films for their use as diffusion barriers in microelectronic devices
Lintanf-Salaün, A., Mantoux, A., Djurado, E., Blanquet, E.
Published in Microelectronic engineering (01.03.2010)
Published in Microelectronic engineering (01.03.2010)
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Journal Article
Conference Proceeding
Elaboration of Ta2O5 Thin Films Using Electrostatic Spray Deposition for Microelectronic Applications
Lintanf, A, Mantoux, A, Blanquet, E, Djurado, E
Published in Journal of physical chemistry. C (19.04.2007)
Published in Journal of physical chemistry. C (19.04.2007)
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Journal Article
Thermodynamic and experimental study of UC powders ignition
Le Guyadec, F., Rado, C., Joffre, S., Coullomb, S., Chatillon, C., Blanquet, E.
Published in Journal of nuclear materials (01.09.2009)
Published in Journal of nuclear materials (01.09.2009)
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Journal Article
Experimental thermodynamics for the evaluation of ALD growth processes
Violet, P., Blanquet, E., Monnier, D., Nuta, I., Chatillon, C.
Published in Surface & coatings technology (25.12.2009)
Published in Surface & coatings technology (25.12.2009)
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Journal Article
Conference Proceeding