PLASMA REACTOR WITH A DYNAMICALLY ADJUSTABLE PLASMA SOURCE POWER APPLICATOR
BIVENS DARIN, PANAYIL SHEEBA J, IBRAHIM IBRAHIM M, KUMAR AJAY, GRIMBERGEN MICHAEL N, LEWINGTON RICHARD, KOCH RENEE, CHANDRACHOOD MADHAVI R
Year of Publication 27.11.2014
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Year of Publication 27.11.2014
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METHODS AND APPARATUS FOR IN-SITU CHAMBER DRY CLEAN DURING PHOTOMASK PLASMA ETCHING
KNICK DAVID, CHANDRAHOOD MADHAVI, BIVENS DARIN, IBRAHIM IBRAHIM, CHEN XIAOYI, KUMAR AJAY, GRIMBERGEN MICHAEL, MAO ZHIGANG
Year of Publication 13.05.2011
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Year of Publication 13.05.2011
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METHOD AND APPARATUS FOR PHOTOMASK PLASMA ETCHING
OUYE ALAN HIROSHI, BIVENS DARIN, PANAYIL SHEEBA J, SABHARWAL AMITABH, KUMAR AJAY, LEWINGTON RICHARD, CHANDRACHOOD MADHAVI R
Year of Publication 02.04.2010
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Year of Publication 02.04.2010
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Method and apparatus for photomask plasma etching
PANAYIL, SHEEBA, J, SABHARWAL, AMITABH, CHANDRAACHOOD, MADHAVI, R, BIVENS, DARIN, KUMAR, AJAY, OUYE, ALAN, HIROSHI, LEWINGTON, RICHARD
Year of Publication 21.09.2016
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Year of Publication 21.09.2016
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Method and apparatus for photomask plasma etching
PANAYIL, SHEEBA, J, SABHARWAL, AMITABH, CHANDRAACHOOD, MADHAVI, R, BIVENS, DARIN, KUMAR, AJAY, OUYE, ALAN, HIROSHI, LEWINGTON, RICHARD
Year of Publication 09.12.2015
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Year of Publication 09.12.2015
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MANUFACTURING METHOD AND APPARATUS FOR PLASMA REACTION APPARATUS COMPONENT
YUAN JIE, BIVENS DARIN, SUN JENNIFER, SABHARWAL AMITABH, RYABOVA ELMIRA, LEWINGTON RICHARD, CHANDRACHOOD MADHAVI R
Year of Publication 18.10.2012
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Year of Publication 18.10.2012
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Method and apparatus for photomask plasma etching
OUYE ALAN HIROSHI, BIVENS DARIN, PANAYIL SHEEBA J, SABHARWAL AMITABH, KUMAR AJAY, LEWINGTON RICHARD, CHANDRACHOOD MADHAVI R
Year of Publication 29.10.2013
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Year of Publication 29.10.2013
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Process for etching a transparent workpiece including backside endpoint detection steps
BIVENS DARIN, KUMAR AJAY, GRIMBERGEN MICHAEL N, LEWINGTON RICHARD, NGUYEN KHIEM K, CHANDRACHOOD MADHAVI R
Year of Publication 06.09.2011
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Year of Publication 06.09.2011
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Mask etch plasma reactor with cathode providing a uniform distribution of etch rate
BIVENS DARIN, KUMAR AJAY, GRIMBERGEN MICHAEL N, LEWINGTON RICHARD, NGUYEN KHIEM K, CHANDRACHOOD MADHAVI R
Year of Publication 23.08.2011
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Year of Publication 23.08.2011
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Plasma reactor for processing a workpiece and having a tunable cathode
Lewington, Richard, Grimbergen, Michael N, Nguyen, Khiem K, Bivens, Darin, Chandrachood, Madhavi R, Kumar, Ajay
Year of Publication 28.06.2011
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Year of Publication 28.06.2011
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Plasma reactor for processing a workpiece and having a tunable cathode
BIVENS DARIN, KUMAR AJAY, GRIMBERGEN MICHAEL N, LEWINGTON RICHARD, NGUYEN KHIEM K, CHANDRACHOOD MADHAVI R
Year of Publication 28.06.2011
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Year of Publication 28.06.2011
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Method and apparatus for photomask etching
Ryabova, Elmira, Lewington, Richard, Chandrachood, Madhavi R, Sabharwal, Amitabh, Bivens, Darin
Year of Publication 21.06.2011
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Year of Publication 21.06.2011
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Method and apparatus for photomask etching
BIVENS DARIN, SABHARWAL AMITABH, RYABOVA ELMIRA, LEWINGTON RICHARD, CHANDRACHOOD MADHAVI R
Year of Publication 21.06.2011
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Year of Publication 21.06.2011
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