The application of low energy ion scattering spectroscopy (LEIS) in sub 28‐nm CMOS technology
Dittmar, Kornelia, Triyoso, Dina H., Erben, Elke, Metzger, Joachim, Binder, Robert, Brongersma, Hidde H., Weisheit, Martin, Engelmann, Hans‐Jürgen
Published in Surface and interface analysis (01.12.2017)
Published in Surface and interface analysis (01.12.2017)
Get full text
Journal Article