A Physics-based Model for Negative Tone Development Materials
Fang, Chao, Smith, Mark D., Robertson, Stewart, Biafore, John J., Pret, Alessandro Vaglio
Published in Journal of Photopolymer Science and Technology (01.01.2014)
Published in Journal of Photopolymer Science and Technology (01.01.2014)
Get full text
Journal Article
네거티브 톤 현상 가능한 포토 레지스트의 컴퓨터 모델링 및 시뮬레이션을 위한 개선된 방법
BLANKENSHIP DAVID A, SMITH MARK D, BIAFORE JOHN J, GRAVES TREY (JOHN) S, VAGLIO PRET ALESSANDRO
Year of Publication 26.02.2019
Get full text
Year of Publication 26.02.2019
Patent
Advances in Resist Materials for 193nm Lithography
Bowden, Murrae J., Gabor, Allen H., Dimov, Ognian, Medina, Arturo N., Foster, Patrick, Steinhäusler, Thomas, Biafore, John J., Spaziano, Gregory, Slater, Sydney G., Blakeney, Andrew J., Neisser, Mark O., Houlihan, Frank M., Cirelli, Ray A., Dabbagh, Gary, Hutton, Richard S., Rushkin, Ilya L., Sweeney, James R., Timko, Allen G., Nalamasu, Om, Reichmanis, Elsa
Published in Journal of Photopolymer Science and Technology (30.05.1999)
Published in Journal of Photopolymer Science and Technology (30.05.1999)
Get full text
Journal Article
Advances in Resist Materials for 193 nm Lithography
Bowden, Murrae J., Gabor, Allen H., Dimov, Ognian, Medina, Arturo N., Foster, Patrick, Steinhäusler, Thomas, Biafore, John J., Spaziano, Gregory, Slater, Sydney G., Blakeney, Andrew J., Neisser, Mark O., Houlihan, Frank M., Cirelli, Ray A., Dabbagh, Gary, Hutton, Richard S., Rushkin, Ilya L., Sweeney, James R., Timko, Allen G., Nalamasu, Om, Reichmanis, Elsa
Published in Journal of photopolymer science and technology (1999)
Published in Journal of photopolymer science and technology (1999)
Get full text
Journal Article