Tin-Fueled High-Repetition-Rate Z-pinch EUV Source for Semiconductor Lithography
Teramoto, Yusuke, Narihiro, Zenzo, Yamatani, Daiki, Yokoyama, Takuma, Bessho, Kazunori, Joshima, Yuki, Shirai, Takahiro, Mouri, Shinsuke, Inoue, Takahiro, Mizokoshi, Hiroshi, Yabuta, Hironobu, Paul, Kohkan C., Takemura, Tetsu, Yokota, Toshio, Kabuki, Kiyoyuki, Miyauchi, Koji, Hotta, Kazuaki, Sato, Hiroto, Niimi, Gohta, Hosokai, Tomonao
Published in 2007 IEEE 34th International Conference on Plasma Science (ICOPS) (01.06.2007)
Published in 2007 IEEE 34th International Conference on Plasma Science (ICOPS) (01.06.2007)
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