Predicting synergy in atomic layer etching
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Published in Journal of vacuum science & technology. A, Vacuum, surfaces, and films (01.09.2017)
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Ion Beam Patterning of High-Density STT-RAM Devices
Ip, Vincent, Shuogang Huang, Carnevale, Santino D., Berry, Ivan L., Rook, Katrina, Lill, Thorsten B., Paranjpe, Ajit P., Cerio, Frank
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Published in IEEE transactions on magnetics (01.02.2017)
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Journal Article
PREDICTING ETCH CHARACTERISTICS IN THERMAL ETCHING AND ATOMIC LAYER ETCHING
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Year of Publication 07.12.2023
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ETCHING METHOD AND ETCHING DEVICE FOR OXIDE LAYERS
MEIHUA SHEN, DAVID J HEMKER, BERRY IVAN L III, THORSTEN LILL, ALAN M SCHOEPP
Year of Publication 14.07.2016
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Year of Publication 14.07.2016
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METHOD FOR ACHIEVING ULTRA-HIGH SELECTIVITY WHILE ETCHING SILICON NITRIDE
PILYEON PARK, JOON HONG PARK, HELEN H ZHU, ANGELOV IVELIN A, FAISAL YAQOOB, LINDA MARQUEZ, BERRY IVAN L III
Year of Publication 01.09.2016
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Year of Publication 01.09.2016
Patent
SELECTIVE NITRIDE ETCH
BERRY IVAN L, ANGELOV IVELIN A, ZHU HELEN H, PARK, PIL YEON, LI ZHAO, YAQOOB FAISAL, MARQUEZ LINDA, THEDJOISWORO BAYU ATMAJA
Year of Publication 29.06.2016
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Year of Publication 29.06.2016
Patent