Verfahren zur Herstellung einer Halbleiterscheibe mit verbesserter Ebenheit
FEUCHTINGER, ERNST, WENSKI, GUIDO, ALTMANN, THOMAS, WINKLER, WOLFGANG, HEIER, GERHARD, BERNWINKLER, WILLI
Year of Publication 14.12.2000
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Year of Publication 14.12.2000
Patent
New double-sided polished semiconductor wafer has extremely low front face site front surface-referenced least squares ratio planarity values varying insignificantly between the wafer edge and central regions
FEUCHTINGER, ERNST, WENSKI, GUIDO, ALTMANN, THOMAS, WINKLER, WOLFGANG, HEIER, GERHARD, BERNWINKLER, WILLI
Year of Publication 31.08.2000
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Year of Publication 31.08.2000
Patent