Sub-10 nm Linewidth and Overlay Performance Achieved with a Fine-Tuned EBPG-5000 TFE Electron Beam Lithography System
Bernd E. Maile, Bernd E. Maile, Wolfgang Henschel, Wolfgang Henschel, Heinrich Kurz, Heinrich Kurz, Bert Rienks, Bert Rienks, Roelof Polman, Roelof Polman, Piet Kaars, Piet Kaars
Published in Japanese Journal of Applied Physics (01.12.2000)
Published in Japanese Journal of Applied Physics (01.12.2000)
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Journal Article
In0.52Al0.48As/InxGa1-xAs (0.53<x<1.0) pseudomorphic high electron mobility transistors with high breakdown voltages : design and performances
DICKMANN, J, RIEPE, K, GEYER, A, MAILE, B. E, SCHURR, A, BERG, M, DAEMBKES, H
Published in Japanese journal of applied physics (1996)
Published in Japanese journal of applied physics (1996)
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Journal Article