RESIST DESIGN CONSIDERATIONS FOR DIRECT WRITE AND PROJECTION ELECTRON-BEAM LITHOGRAPHY TECHNOLOGIES
Novembre, Anthony E., Tarascon, Regine G., Berger, Steven D., Biddick, Chris J., Blakey, Myrtle I., Bolan, Kevin J., Fetter, Linus A., Harriott, Lloyd R., Huggins, Harold A., Knurek, Chester S., Liddle, J. Alexander, Mixon, David A., Peabody, Milton L.
Published in Journal of Photopolymer Science and Technology (1996)
Published in Journal of Photopolymer Science and Technology (1996)
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Journal Article
The SCattering with Angular Limitation in Projection Electron-beam Lithography (SCALPEL) system
LIDDLE, J. A, BERGER, S. D, CUSTY, J, FARROW, R. C, FELKER, J. A, FETTER, L. A, FREEMAN, B, HARRIOTT, L. R, HOPKINS, L.L, HUGGINS, H. A, KNUREK, C. S, KRAUS, J. S, BIDDICK, C. J, MIXON, D. A, MKRTCHYAN, M. M, NOVEMBRE, A. E, PEABODY, M. L, SIMPSON, W. M, TARASCON, R. G, WADE, H. H, WASKIEWICZ, W. K, WATSON, G. P, WILLIAMS, J. K, BLAKEY, M. I, WINDT, D. L, BOLAN, BOWLER, S. W, BRADY, K, CAMARDA, R. M, CONNELLY, W. F, CHORKEN, A
Published in Japanese Journal of Applied Physics (01.12.1995)
Published in Japanese Journal of Applied Physics (01.12.1995)
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Conference Proceeding
Journal Article
Proximity effect correction in projection electron beam lithography (scattering with angular limitation projection electron-beam lithography)
LIDDLE, J. A, WATSON, G. P, BERGER, S. D, MILLER, P. D
Published in Japanese Journal of Applied Physics (1995)
Published in Japanese Journal of Applied Physics (1995)
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Conference Proceeding
Journal Article