Contact hole shrink by directed self-assembly: Process integration and stability monitored on 300 mm pilot line
Servin, Isabelle, Tiron, Raluca, Gharbi, Ahmed, Argoud, Maxime, Jullian, Karine, Chamiot-Maitral, Gaëlle, Barros, Patricia Pimenta, Chevalier, Xavier, Belledent, Jérôme, Bossy, Xavier, Moulis, Sylvain, Navarro, Christophe, Cunge, Gilles, Barnola, Sébastien, Asai, Masaya, Pieczulewski, Charles
Published in Japanese Journal of Applied Physics (01.06.2014)
Published in Japanese Journal of Applied Physics (01.06.2014)
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Journal Article
Etch modeling for model-based optical proximity correction for 65nm node
Gardin, Christian, Belledent, Jérôme, Trouiller, Yorick, Borjon, Amandine, Couderc, Christophe, Foussadier, Franck, Yesilada, Emek, Urbani, Jean-Christophe, Sundermann, Frank, Rody, Yves, Saied, Mazen, Planchot, Jonathan, Robert, Frederic
Published in Microelectronic engineering (01.05.2007)
Published in Microelectronic engineering (01.05.2007)
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Journal Article
Etch modeling for model-based optical proximity correction for 65 nm node
Gardin, Christian, Belledent, Jérôme, Trouiller, Yorick, Borjon, Amandine, Couderc, Christophe, Foussadier, Franck, Yesilada, Emek, Urbani, Jean-Christophe, Sundermann, Frank, Rody, Yves, Saied, Mazen, Planchot, Jonathan, Robert, Frederic
Published in Microelectronic engineering (01.05.2007)
Published in Microelectronic engineering (01.05.2007)
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Journal Article
Conference Proceeding
Analysis of the diffraction pattern for optimal assist feature placement
Borjon, Amandine, Belledent, Jérôme, Trouiller, Yorick, Gardin, Christian, Couderc, Christophe, Rody, Yves, Sundermann, Frank, Urbani, Jean-Christophe, Foussadier, Franck, Planchot, Jonathan, Yesilada, Emek, Montgomery, Patrick, Willkinson, Bill, Saied, Mazen, Martinelli, Catherine, Kerrien, Gurwan, Cam, Laurent Le, Vautrin, Florent, Robert, Frédéric, Schiavone, Patrick
Published in Microelectronic engineering (01.05.2007)
Published in Microelectronic engineering (01.05.2007)
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Journal Article
Conference Proceeding
Critical failure ORC: Improving model accuracy through enhanced model generation
Borjon, Amandine, Belledent, Jérôme, Trouiller, Yorick, Patterson, Kyle, Lucas, Kevin, Gardin, Christian, Couderc, Christophe, Rody, Yves, Sundermann, Frank, Urbani, Jean-Christophe, Baron, Stanislas, Foussadier, Frank, Schiavone, Patrick
Published in Microelectronic engineering (01.04.2006)
Published in Microelectronic engineering (01.04.2006)
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Journal Article
Conference Proceeding