준금속 (metalloid) 또는 금속 함유 하드마스크의 증착을 사용한 선택적인 에칭
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Year of Publication 16.12.2022
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Year of Publication 16.12.2022
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Year of Publication 09.11.2023
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SELECTIVE ETCH USING DEPOSITION OF A METALLOID OR METAL CONTAINING HARDMASK
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Year of Publication 20.04.2023
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Year of Publication 20.04.2023
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SELECTIVE ETCH USING DEPOSITION OF A METALLOID OR METAL CONTAINING HARDMASK
PAN, Yang, LEE, Younghee, PETER, Daniel, BALAN, Arunima Deya, TAN, Samantha SiamHwa
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Year of Publication 14.10.2021
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Year of Publication 28.09.2023
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Year of Publication 28.09.2023
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HIGH ENERGY ATOMIC LAYER ETCH OF A CARBON CONTAINING LAYER
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Year of Publication 28.09.2023
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Year of Publication 28.09.2023
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Co-deposition and etch process
YANG, WENBING, TAN, SAMANTHA SIAMHWA, LEE, YOUNGHEE, FLORES ESPINOSA, MICHELLE MARGARITA, BALAN, ARUNIMA DEYA, FAN, YIWEN
Year of Publication 16.02.2024
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Year of Publication 16.02.2024
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Selective etch using deposition of a metalloid or metal containing hardmask
TAN, SAMANTHA SIAMHWA, PETER, DANIEL, LEE, YOUNGHEE, BALAN, ARUNIMA DEYA, PAN, YANG
Year of Publication 01.02.2022
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Year of Publication 01.02.2022
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Fast atomic layer etch
THOMAS, CLINT EDWARD, YANG, WENBING, BENNET, ALEXANDER DECLAN, TAN, SAMANTHA SIAMHWA, PATRICK, ROGER, LEE, YOUNG AH, LI, BAICHANG, WITKOWICKI, DEREK, PAN, YANG, FAN, YIWEN, BALAN, ARUNIMA DEYA, VAN CLEEMPUT, PATRICK AUGUST
Year of Publication 16.01.2024
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Year of Publication 16.01.2024
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High energy atomic layer etch of a carbon containing layer
LEE, YOUNG AH, LI, BAICHANG, FAN, YIWEN, PAN, YANG, VAN CLEEMPUT, PATRICK AUGUST, THOMAS, CLINT EDWARD, YANG, WENBING, BENNET, ALEXANDER DECLAN, TAN, SAMANTHA SIAMHWA, PATRICK, ROGER, LEE, YOUNGHEE, WITKOWICKI, DEREK, BALAN, ARUNIMA DEYA
Year of Publication 01.01.2024
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Year of Publication 01.01.2024
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