USE OF HYPOFLUORITES, FLUOROPEROXIDES AND/OR FLUOROTRIOXIDES AS OXIDANT IN FLUOROCARBON ETCHING PLASMA FOR ETCHING DIELECTRIC MATERIAL FROM MULTILAYER SUBSTRATE
BADOWSKI, PETER R, SYVRET, ROBERT GEORGE, JI, BING, WITHERS, HOWARD PAUL JR, MOTIKA, STEPHEN ANDREW, PEARLSTEIN, RONALD MARTIN, KARWACKI, EUGENE JOSEPH JR
Year of Publication 21.01.2005
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Year of Publication 21.01.2005
Patent
UNSATURATED OXYGENATED FLUOROCARBON FOR USE IN SELECTIVE ANISOTROPIC ETCHING OF DIELECTRIC MATERIAL IN MULTILAYER SUBSTRATE
BADOWSKI, PETER R, SYVRET, ROBERT GEORGE, JI, BING, MOTIKA, STEPHEN ANDREW, PEARLSTEIN, RONALD MARTIN, BERGER, KERRY RENARD, KARWACKI, EUGENE JOSEPH JR
Year of Publication 21.01.2005
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Year of Publication 21.01.2005
Patent
Fluorine plasma chemistry for high-AR dielectric etching
Ji, Bing, Motika, Stephen A, Badowski, Peter R, Seksan Dheandhanoo
Published in Solid state technology (01.11.2005)
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Published in Solid state technology (01.11.2005)
Magazine Article
Removal of transition metal ternary and/or quaternary barrier materials from a substrate
KARWACKI EUGENE J.JR, BADOWSKI PETER R, PLISHKA MARTIN J, JI BING, WU DINGJUN
Year of Publication 26.05.2005
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Year of Publication 26.05.2005
Patent
Use of hypofluorites, fluoroperoxides, and/or fluorotrioxides as oxidizing agent in fluorocarbon etch plasmas
BADOWSKI, PETER R, JI, BING, SYVRET, ROBERT GEORGE, MOTIKA, STEPHEN ANDREW, PEARLSTEIN, RONALD MARTIN, WITHERS, HOWARD PAUL, JR, KARWACKI, EUGENE JOSEPH JR
Year of Publication 24.08.2005
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Year of Publication 24.08.2005
Patent
USE OF HYPOFLUORITES, FLUOROPEROXIDES, AND/OR FLUOROTRIOXIDES AS OXIDIZING AGENT IN FLUOROCARBON ETCH PLASMAS
PETER R. BADOWSKI, BING JI, STEPHEN ANDREW MOTIKA, EUGENE JOSEPH KARWACKI, JR, ROBERT GEORGE SYVRET, HOWARD PAUL WITHERS, JR, RONALD MARTIN PEARLSTEIN
Year of Publication 30.05.2005
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Year of Publication 30.05.2005
Patent
Use of hypofluorites, fluoroperoxides, and/or fluorotrioxides as oxidizing agent in fluorocarbon etch plasmas
BADOWSKI PETER R, SYVRET ROBERT GEORGE, MOTIKA STEPHEN ANDREW, WITHERS HOWARD PAUL, JI BING, PEARLSTEIN RONALD MARTIN, KARWACKI EUGENE JOSEPH
Year of Publication 23.03.2005
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Year of Publication 23.03.2005
Patent
USE OF HYPOFLUORITE, FLUOROPEROXIDE, AND/OR FLUOROTRIOXIDE AS OXIDIZING AGENT IN FLUOROCARBON ETCHING PLASMA
BADOWSKI PETER R, SYVRET ROBERT GEORGE, WITHERS JR HOWARD P, MOTIKA STEPHEN ANDREW, JI BING, PEARLSTEIN RONALD MARTIN, KARWACKI EUGENE JOSEPH JR
Year of Publication 24.02.2005
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Year of Publication 24.02.2005
Patent
Use of hypofluorites, fluoroperoxides, and/or fluorotrioxides as oxidizing agent in fluorocarbon etch plasmas
BADOWSKI PETER R, SYVRET ROBERT GEORGE, MOTIKA STEPHEN ANDREW, WITHERS HOWARD PAUL, JI BING, PEARLSTEIN RONALD MARTIN, KARWACKI EUGENE JOSEPH
Year of Publication 20.01.2005
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Year of Publication 20.01.2005
Patent
Use of hypofluorites, fluoroperoxides, and/or fluorotrioxides as oxidizing agent in fluorocarbon etch plasmas
BADOWSKI, PETER R, JI, BING, SYVRET, ROBERT GEORGE, MOTIKA, STEPHEN ANDREW, PEARLSTEIN, RONALD MARTIN, WITHERS, HOWARD PAUL, JR, KARWACKI, EUGENE JOSEPH JR
Year of Publication 19.01.2005
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Year of Publication 19.01.2005
Patent
Use of hypofluorites, fluoroperoxides, and/or fluorotrioxides as oxidizing agent in fluorocarbon etch plasmas
BADOWSKI, PETER R, JI, BING, SYVRET, ROBERT GEORGE, MOTIKA, STEPHEN ANDREW, PEARLSTEIN, RONALD MARTIN, WITHERS, HOWARD PAUL, KARWACKI, EUGENE JOSEPH
Year of Publication 16.01.2005
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Year of Publication 16.01.2005
Patent