Low-temperature strain relaxation in SiGe/Si heterostructures implanted with Ge + ions
Avrutin, V.S., Izyumskaya, N.F., Vyatkin, A.F., Zinenko, V.I., Agafonov, Yu.A., Irzhak, D.V., Roshchupkin, D.V., Steinman, E.A., Vdovin, V.I., Yugova, T.G.
Published in Materials science & engineering. B, Solid-state materials for advanced technology (15.06.2003)
Published in Materials science & engineering. B, Solid-state materials for advanced technology (15.06.2003)
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Journal Article
Low-temperature strain relaxation in ion-irradiated pseudomorphic SiGe/Si structures
Avrutin, V.S, Izyumskaya, N.F, Vyatkin, A.F, Zinenko, V.I, Agafonov, Yu.A, Irzhak, D.V, Roshchupkin, D.V, Steinman, E.A, Vdovin, V.I, Yugova, T.G
Published in Materials science & engineering. B, Solid-state materials for advanced technology (14.02.2002)
Published in Materials science & engineering. B, Solid-state materials for advanced technology (14.02.2002)
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Journal Article
Effect of annealing environment on antimony redistribution in pseudomorphic Si/SiGe/Si〈Sb〉 heterostructures
Avrutin, V.S., Barabanenkov, M.Yu, Izyumskaya, N.F., Pustovit, A.N., Vyatkin, A.F., Loiko, N.N.
Published in Materials science & engineering. B, Solid-state materials for advanced technology (14.02.2002)
Published in Materials science & engineering. B, Solid-state materials for advanced technology (14.02.2002)
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Journal Article
Silicon molecular beam epitaxial growth on ultra-small mesa structures
Avrutin, V.S., Izumskaya, N.F., Vyatkin, A.F., Yunkin, V.A.
Published in Journal of crystal growth (01.12.1995)
Published in Journal of crystal growth (01.12.1995)
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Journal Article
Ion beam induced strain relaxation in pseudomorphous epitaxial SiGe layers
Vyarkin, A.F., Avrutin, V.S., Izyumskaya, N.F., Egorov, V.K., Starkov, V.V., Zinenko, V.I., Smirnova, I.A., Hemment, P.L.F., Nejim, A., Vdovin, V.I., Yugova, T.G.
Published in 2000 International Conference on Ion Implantation Technology Proceedings. Ion Implantation Technology - 2000 (Cat. No.00EX432) (2000)
Published in 2000 International Conference on Ion Implantation Technology Proceedings. Ion Implantation Technology - 2000 (Cat. No.00EX432) (2000)
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Conference Proceeding