GeSn heterostructure micro-disk laser operating at 230 K
Thai, Quang Minh, Pauc, Nicolas, Aubin, Joris, Bertrand, Mathieu, Chrétien, Jérémie, Delaye, Vincent, Chelnokov, Alexei, Hartmann, Jean-Michel, Reboud, Vincent, Calvo, Vincent
Published in Optics express (10.12.2018)
Published in Optics express (10.12.2018)
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Journal Article
Ni/GeSn solid‐state reaction monitored by combined X‐ray diffraction analyses: focus on the Ni‐rich phase
Quintero, Andrea, Gergaud, Patrice, Aubin, Joris, Hartmann, Jean-Michel, Reboud, Vincent, Rodriguez, Philippe
Published in Journal of applied crystallography (01.08.2018)
Published in Journal of applied crystallography (01.08.2018)
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Journal Article
Progress in Germanium Tin (GeSn) Photonic Crystal Lasers
Thai, Quang Minh, Chretien, Jeremie, Bertrand, Mathieu, Aubin, Joris, Casiez, Lara, Chelnokov, Alexei, Hartmann, Jean-Michel, Reboud, Vincent, Pauc, Nicolas, Calvo, Vincent
Published in IEEE journal of selected topics in quantum electronics (01.01.2022)
Published in IEEE journal of selected topics in quantum electronics (01.01.2022)
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Journal Article
Growth and characterization of SiGeSn pseudomorphic layers on 200 mm Ge virtual substrates
Khazaka, Rami, Nolot, Emmanuel, Aubin, Joris, Hartmann, Jean-Michel
Published in Semiconductor science and technology (07.11.2018)
Published in Semiconductor science and technology (07.11.2018)
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Journal Article
Experimental Calibration of Sn‐Related Varshni Parameters for High Sn Content GeSn Layers
Bertrand, Mathieu, Thai, Quang‐Minh, Chrétien, Jérémie, Pauc, Nicolas, Aubin, Joris, Milord, Laurent, Gassenq, Alban, Hartmann, Jean‐Michel, Chelnokov, Alexei, Calvo, Vincent, Reboud, Vincent
Published in Annalen der Physik (01.06.2019)
Published in Annalen der Physik (01.06.2019)
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Journal Article
Comparative Analysis of Ni- and Ni 0.9 Pt 0.1 -Ge 0.9 Sn 0.1 Solid-State Reaction by Combined Characterizations Methods
Quintero, Andrea, Gergaud, Patrice, Aubin, Joris, Hartmann, Jean-Michel, Chevalier, Nicolas, Reboud, Vincent, Cassan, Eric, Rodriguez, Philippe
Published in ECS transactions (20.07.2018)
Published in ECS transactions (20.07.2018)
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Journal Article
(Invited) Laser Thermal Annealing for Low Thermal Budget Applications: From Contact Formation to Material Modification
Huet, Karim, Tabata, Toshiyuki, Aubin, Joris, Rozé, Fabien, Thuries, Louis, Halty, Sebastien, Curvers, Benoit, Mazzamuto, Fulvio, Liu, J., Mori, Yoshihiro
Published in ECS transactions (23.04.2019)
Published in ECS transactions (23.04.2019)
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Journal Article
Composition and Strain Evolution of Undoped Si 0.8 Ge 0.2 Layers Submitted to UV-Nanosecond Laser Annealing
Dagault, Lea, Acosta-Alba, Pablo, Kerdilès, Sébastien, Barnes, Jean-Paul, Hartmann, Jean-Michel, Gergaud, Patrice, Nguyen, Than Tra, Grenier, Adeline, Aubin, Joris, Cristiano, Fuccio
Published in ECS transactions (20.07.2018)
Published in ECS transactions (20.07.2018)
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Journal Article
Comparative Analysis of Ni- and Ni0.9Pt0.1-Ge0.9Sn0.1 Solid-State Reaction by Combined Characterizations Methods
Quintero, Andrea, Gergaud, Patrice, Aubin, Joris, Hartmann, Jean-Michel, Chevalier, Nicolas, Reboud, Vincent, Cassan, Eric, Rodriguez, Philippe
Published in ECS transactions (01.01.2018)
Published in ECS transactions (01.01.2018)
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Journal Article
Impact of Wet Treatments on the Electrical Performance of Ge0.9Sn0.1-Based p‑MOS Capacitors
Mahjoub, Mohamed Aymen, Haffner, Thibault, Labau, Sébastien, Eustache, Etienne, Aubin, Joris, Hartmann, Jean-Michel, Ghibaudo, Gérard, Pelissier, Bernard, Bassani, Franck, Salem, Bassem
Published in ACS applied electronic materials (26.02.2019)
Published in ACS applied electronic materials (26.02.2019)
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Journal Article
Composition and Strain Evolution of Undoped Si0.8Ge0.2 Layers Submitted to UV-Nanosecond Laser Annealing
Dagault, Lea, Acosta-Alba, Pablo, Kerdilès, Sébastien, Barnes, Jean-Paul, Hartmann, Jean-Michel, Gergaud, Patrice, Nguyen, Than Tra, Grenier, Adeline, Aubin, Joris, Cristiano, Fuccio
Published in ECS transactions (20.07.2018)
Published in ECS transactions (20.07.2018)
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Journal Article
Impact of Wet Treatments on the Electrical Performance of Ge 0.9 Sn 0.1 -Based p-MOS Capacitors
Mahjoub, Mohamed Aymen, Haffner, Thibault, Labau, Sébastien, Eustache, Etienne, Aubin, Joris, Hartmann, Jean-Michel, Ghibaudo, Gérard, Pelissier, Bernard, Bassani, Franck, Salem, Bassem
Published in ACS applied electronic materials (26.02.2019)
Published in ACS applied electronic materials (26.02.2019)
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Journal Article