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Integrated process for depositing layer of high-K dielectric with in-situ control of K value and thickness of high-K dielectric layer
by
Halliyal, Arvind
,
Arsania
,
Farzad
Year of Publication
04.11.2003
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Integrated process for depositing layer of high-K dielectric with in-situ control of K value and thickness of high-K dielectric layer
by
ARSANIA FARZAD
,
HALLIYAL ARVIND
Year of Publication
04.11.2003
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Patent
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basic electric elements
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chemical surface treatment
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coating material with metallic material
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coating metallic material
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diffusion treatment of metallic material
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