Elementary Surface Reaction Simulation of Aluminum Chemical Vapor Deposition from Dimethylaluminumhydride Based on Ab Initio Calculations: Theoretical Process Optimization Procedure (2)
Masakazu Sugiyama, Masakazu Sugiyama, Tohru Nakajima, Tohru Nakajima, Takeo Tanaka, Takeo Tanaka, Hitoshi Itoh, Hitoshi Itoh, Jyun-ichi Aoyama, Jyun-ichi Aoyama, Yasuyuki Egashira, Yasuyuki Egashira, Kohichi Yamashita, Kohichi Yamashita, Hiroshi Komiyama, Hiroshi Komiyama, Yukihiro Shimogaki, Yukihiro Shimogaki
Published in Japanese Journal of Applied Physics (01.12.2000)
Published in Japanese Journal of Applied Physics (01.12.2000)
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Journal Article
Reaction Analysis of Aluminum Chemical Vapor Deposition from Dimethyl-aluminum-hydride Using Tubular Reactor and Fourier-Transform Infrared Spectroscopy: Theoretical Process Optimization Procedure (1)
Sugiyama, Masakazu, Itoh, Hitoshi, Komiyama, Jyun-ichi Aoyama, Shimogaki, Yukihiro
Published in Japanese Journal of Applied Physics (01.03.2000)
Published in Japanese Journal of Applied Physics (01.03.2000)
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Journal Article
Effect of Underlayers on the Morphology and Orientation of Aluminum Films Prepared by Chemical Vapor Deposition Using Dimethylaluminumhydride
Sugiyama, Masakazu, Iino, Tomohisa, Itoh, Hitoshi, Aoyama, Jyun-ichi, Komiyama, Hiroshi, Shimogaki, Yukihiro
Published in Japanese Journal of Applied Physics (1999)
Published in Japanese Journal of Applied Physics (1999)
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Journal Article
Examination of Surface Elementary Reaction Model for Chemical Vapor Deposition of Al Using In Situ Infrared Reflection Absorption Spectroscopy: Teoretical Optimization Procedure (3)
Sugiyama, Masakazu, Ogawa, Hiroki, Sato, Yusuke, Itoh, Hitoshi, Aoyama, Jyun-ichi, Horiike, Yasuhiko, Komiyama, Hiroshi, Shimogaki, Yukihiro
Published in Japanese Journal of Applied Physics (01.02.2002)
Published in Japanese Journal of Applied Physics (01.02.2002)
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Journal Article