Thermal Decomposition In Situ Monitoring System of the Gas Phase Cyclopentadienyl Tris(dimethylamino) Zirconium (CpZr(NMe2)3) Based on FT-IR and QMS for Atomic Layer Deposition
An, Jong-Ki, Choi, Eunmi, Shim, Seob, Kim, Hayeong, Kang, Goru, Yun, Ju-Young
Published in Nanoscale research letters (04.09.2020)
Published in Nanoscale research letters (04.09.2020)
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Journal Article
Effect of Growth Temperature on the Structural and Electrical Properties of ZrO₂ Films Fabricated by Atomic Layer Deposition Using a CpZr[N(CH₃)₂]₃/C₇H₈ Cocktail Precursor
An, Jong-Ki, Chung, Nak-Kwan, Kim, Jin-Tae, Hahm, Sung-Ho, Lee, Geunsu, Lee, Sung Bo, Lee, Taehoon, Park, In-Sung, Yun, Ju-Young
Published in Materials (05.03.2018)
Published in Materials (05.03.2018)
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Journal Article
Long-term thermal stability of NPB molecule under high-vacuum
Shim, Seob, Kim, Hayeong, Choi, Eunmi, An, Jong-Ki, Kang, Goru, Kwon, Ohyun, Chung, Nak-Kwan, Kim, Jin-Tae, Yun, Ju-Young
Published in Organic electronics (01.02.2020)
Published in Organic electronics (01.02.2020)
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Journal Article
Oxidant effect of La(NO3)3·6H2O solution on the crystalline characteristics of nanocrystalline ZrO2 films grown by atomic layer deposition
Oh, Nam Khen, Kim, Jin-Tae, Kang, Goru, An, Jong-Ki, Nam, Minwoo, Kim, So Yeon, Park, In-Sung, Yun, Ju-Young
Published in Applied surface science (01.02.2017)
Published in Applied surface science (01.02.2017)
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Journal Article
In-situ Monitoring System Equipped with FT-IR and QMS and Thermal Decomposition of Zr(NCH3C2H5)4 Precursor
Park, In-Sung, Seong, Sejong, Jung, Yongchan, Lee, Taehoon, Ahn, Jin-Ho, An, Jong-Ki, Yun, Juyoung
Published in ECS transactions (16.08.2016)
Published in ECS transactions (16.08.2016)
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Journal Article
GaN MISIM Diode with High-k Dielectrics of ZrO2 and Al2O3 for UV Sensing
Lee, Gil-Ho, Seol, Jeong-Hoon, An, Jong-Ki, Yun, Ju-Young, Hahm, Sung-Ho
Published in ECS transactions (01.01.2016)
Published in ECS transactions (01.01.2016)
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Journal Article
ZrO2 film prepared by atomic layer deposition using less viscous cocktail CpZr[N(CH3)2]3/C7H8 precursor and ozone
An, Jong-Ki, Kim, Jin-Tae, Kang, Goru, Oh, Nam Khen, Hahm, Sung-Ho, Lee, Geunsu, Park, In-Sung, Yun, Ju-Young
Published in Journal of alloys and compounds (15.04.2017)
Published in Journal of alloys and compounds (15.04.2017)
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Journal Article
ZrO^sub 2^ film prepared by atomic layer deposition using less viscous cocktail CpZr[N(CH^sub 3^)^sub 2]3^/C^sub 7^H^sub 8^ precursor and ozone
An, Jong-Ki, Kim, Jin-Tae, Kang, Goru, Oh, Nam Khen, Hahm, Sung-Ho, Lee, Geunsu, Park, In-Sung, Yun, Ju-Young
Published in Journal of alloys and compounds (15.04.2017)
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Published in Journal of alloys and compounds (15.04.2017)
Journal Article
Oxidant effect of La(NO3)3.6H2O solution on the crystalline characteristics of nanocrystalline ZrO2 films grown by atomic layer deposition
Oh, Nam Khen, Kim, Jin-Tae, Kang, Goru, An, Jong-Ki, Nam, Minwoo, Kim, So Yeon, Park, In-Sung, Yun, Ju-Young
Published in Applied surface science (01.02.2017)
Published in Applied surface science (01.02.2017)
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Journal Article
GaN MISIM Diode with High-k Dielectrics of ZrO 2 and Al 2 O 3 for UV Sensing
Lee, Gil-Ho, Seol, Jeong-Hoon, An, Jong-Ki, Yun, Ju-Young, Hahm, Sung-Ho
Published in ECS transactions (23.08.2016)
Published in ECS transactions (23.08.2016)
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Journal Article
Method and apparatus for atomic layer etching
Cho, Byung Chul, An, Jong Ki, Han, Tian Hao, Jin, Kwang Seon, Park, Sang Jun, Kwon, Jun Hyuck
Year of Publication 10.10.2023
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Year of Publication 10.10.2023
Patent
GaN MISIM Diode with High-k Dielectrics of ZrO 2 and Al 2 O 3 for UV Sensing
Lee, Gil-Ho, Seol, Jeong-Hoon, An, Jong-Ki, Yun, Ju-Young, Hahm, Sung-Ho
Published in Meeting abstracts (Electrochemical Society) (01.09.2016)
Published in Meeting abstracts (Electrochemical Society) (01.09.2016)
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Journal Article
In-situ Monitoring System Equipped with FT-IR and QMS and Thermal Decomposition of Zr(NCH 3 C 2 H 5 ) 4 Precursor
Park, In-Sung, Seong, Sejong, Jung, Yongchan, Lee, Taehoon, Ahn, Jin-Ho, An, Jong-Ki, Yun, Juyoung
Published in Meeting abstracts (Electrochemical Society) (01.09.2016)
Published in Meeting abstracts (Electrochemical Society) (01.09.2016)
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Journal Article
METHOD AND APPARATUS FOR ATOMIC LAYER ETCHING
CHO, Byung Chul, JIN, Kwang Seon, HAN, Tian Hao, KWON, Jun Hyuck, AN, Jong Ki, PARK, Sang Jun
Year of Publication 24.02.2022
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Year of Publication 24.02.2022
Patent
Method and apparatus for atomic layer etching
KWON, JUN HYUCK, JIN, KWANG SEON, AN, JONG KI, HAN, TIAN HAO, CHO, BYUNG CHUL, PARK, SANG JUN
Year of Publication 01.08.2023
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Year of Publication 01.08.2023
Patent
Method and apparatus for atomic layer etching
PARK, SANG-JUN, CHO, BYUNGUL, KWON, JUN-HYUCK, AN, JONG-KI, JIN, KWANG-SEON, HAN, TIAN-HAO
Year of Publication 01.03.2022
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Year of Publication 01.03.2022
Patent
Atomic layer etching method and device
TIAN-HAO HAN, PARK SANG-JUN, JIN KWANG-SEON, KWON JUN-HYUCK, CHO BYUNGUL, JONG-KI AN
Year of Publication 22.02.2022
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Year of Publication 22.02.2022
Patent