Removal of SOC Hard Mask for Patterning of Work Function Metal by Thermally Activated Ozone Gas
Iwahata, Shota, Inaba, Masaki, Altamirano-Sanchez, Efrain, Sebaai, Farid
Published in Solid state phenomena (01.02.2021)
Published in Solid state phenomena (01.02.2021)
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Journal Article
Characterization of Wetting of Deep Silica Nanoholes by Aqueous Solutions Using ATR-FTIR
Holsteyns, Frank, Iino, Hideaki, Vereecke, Guy, Altamirano-Sanchez, Efrain, Darcos, Audrey
Published in Solid state phenomena (01.02.2021)
Published in Solid state phenomena (01.02.2021)
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Journal Article
New Test Structure Development for Pattern Collapse Evaluations
Delvaux, Christie, Xu, Xiu Mei, Pak, Murat, Mannaert, Geert, Altamirano-Sanchez, Efrain, Sebaai, Farid
Published in Solid state phenomena (01.02.2021)
Published in Solid state phenomena (01.02.2021)
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Journal Article
Removal of Post Etch Residue on BEOL Low-K with Nanolift
Le, Quoc Toan, Akanishi, Yuya, Altamirano-Sanchez, Efrain
Published in Solid state phenomena (01.02.2021)
Published in Solid state phenomena (01.02.2021)
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Journal Article
Formation of a Nanoscale SiO2 Capping Layer on Photoresist Lines with an Ar/SiCl4/O2 Inductively Coupled Plasma: A Modeling Investigation
Tinck, Stefan, Altamirano-Sánchez, Efrain, De Schepper, Peter, Bogaerts, Annemie
Published in Plasma processes and polymers (01.01.2014)
Published in Plasma processes and polymers (01.01.2014)
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Journal Article
Area-Selective Atomic Layer Deposition of TiN, TiO2, and HfO2 on Silicon Nitride with inhibition on Amorphous Carbon
Stevens, Eric, Tomczak, Yoann, Chan, B. T, Altamirano Sanchez, Efrain, Parsons, Gregory N, Delabie, Annelies
Published in Chemistry of materials (22.05.2018)
Published in Chemistry of materials (22.05.2018)
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Journal Article
Spin-on Metal Oxides and Their Applications for Next Generation Lithography
Yao, Huirong, Mullen, Salem, Wolfer, Elizabeth, Mckenzie, Douglas, Dioses, Alberto, Rahman, Dalil, Cho, JoonYeon, Padmanaban, Munirathna, Petermann, Claire, Hong, SungEun, Mannaert, Geert, Hopf, Toby, Simone, Danilo De, Vangoidsenhoven, Diziana, Lorant, Christophe, Sebaai, Farid, Sanchez, Efrain Altamirano
Published in Journal of Photopolymer Science and Technology (01.01.2016)
Published in Journal of Photopolymer Science and Technology (01.01.2016)
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Journal Article
A Cleaning Method for Post-Etch Ruthenium Residue Removal Using UV and Liquid Chemical
Le, Quoc Toan, Tanaka, Takayoshi, Kawarazaki, Hikaru, Altamirano-Sanchez, Efrain, Nakano, Teppei
Published in Solid state phenomena (14.08.2023)
Published in Solid state phenomena (14.08.2023)
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Journal Article
Investigation of Selective Wet Etching of SiGe Substrates for High-Performance Device Manufacturing
Wostyn, Kurt, Puttarame Gowda, Pallavi, Kim, Dong Gyu, Park, Jin Goo, Vereecke, Guy, Kim, Tae Gon, Altamirano-Sanchez, Efrain
Published in Solid state phenomena (14.08.2023)
Published in Solid state phenomena (14.08.2023)
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Journal Article
Monitoring of Trace Molecular Impurities in Clean-Room Air
Mertens, Paul W., Van Ongeval, Joost, Kenis, Karine, De Vita, Marie, Altamirano-Sanchez, Efrain
Published in Solid state phenomena (14.08.2023)
Published in Solid state phenomena (14.08.2023)
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Journal Article
SiGe Selective Etching to Enable Bottom and Middle Dielectric Isolations for Advanced Gate-All-Around FET Architecture
Yusuke, Oniki, Altamirano-Sanchez, Efrain, Ishizu, Takaaki, Sebaai, Farid, Liu, Wen, Wu, Ai Ping, Lai, Ju Geng, Tanaka, Takayoshi, Chen, Jason, Kawashima, Tomohiko, Kawarazaki, Hikaru, Nakano, Teppei
Published in Solid state phenomena (14.08.2023)
Published in Solid state phenomena (14.08.2023)
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Journal Article
Effect of Surface Chemistry on Ruthenium Wet Etching
Le, Quoc Toan, Doms, M., Altamirano-Sanchez, Efrain, Kesters, E.
Published in Solid state phenomena (01.02.2021)
Published in Solid state phenomena (01.02.2021)
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Journal Article
Challenges and Solutions of Replacement Metal Gate Patterning to Enable Gate-all-Around Device Scaling
Horiguchi, Naoto, Holsteyns, Frank, Oniki, Yusuke, Dentoni Litta, Eugenio, Ragnarsson, Lars Åke, Chan, Boon Teik, Hopf, Toby, Dekkers, Harold, Iino, Hideaki, Cott, Daire, Altamirano-Sanchez, Efrain, Sebaai, Farid
Published in Solid state phenomena (01.02.2021)
Published in Solid state phenomena (01.02.2021)
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Journal Article
Extreme silicon thinning for back side power delivery network: Si thinning stopping on scaled SiGe etch stop layer
Sebaai, Farid, Loo, Roger, Jourdain, Anne, Beyne, Eric, Kawarazaki, Hikaru, Nakano, Teppei, Sanchez, Efrain Altamirano
Published in Microelectronic engineering (15.11.2024)
Published in Microelectronic engineering (15.11.2024)
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Journal Article
Ice-VII-like Structure Observed By XRD in Water Confined in Silica Nanoholes
Vereecke, Guy, Kenis, Karine, Wostyn, Kurt, Sanchez, Efrain Altamirano
Published in ECS transactions (20.05.2022)
Published in ECS transactions (20.05.2022)
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Journal Article
Using water structuring by ions to address pattern loading in wet HF-based oxide recess etch
Vereecke, Guy, De Coster, Hanne, Dochain, Denis, Nurekeyeva, Kunsulu, Conlan, Shona, Nsimba, Anthony, Wostyn, Kurt, Sanchez, Efrain Altamirano
Published in Microelectronic engineering (15.07.2023)
Published in Microelectronic engineering (15.07.2023)
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Journal Article
PLASMA METHOD FOR REDUCING POST-LITHOGRAPHY LINE WIDTH ROUGHNESS
ALTAMIRANO SANCHEZ EFRAIN, DE MARNEFFE JEAN FRANCOIS, DE SCHEPPER PETER
Year of Publication 18.08.2015
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Year of Publication 18.08.2015
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