Tantalum-doped tin oxide thin films using hollow cathode gas flow sputtering technology
Huo, Fangfang, Muydinov, Ruslan, Seibertz, Bertwin Bilgrim Otto, Wang, Can, Hartig, Manuel, Alktash, Nivin, Gao, Peng, Szyszka, Bernd
Published in Heliyon (30.05.2024)
Published in Heliyon (30.05.2024)
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Hollow Cathode Gas Flow Sputtering of Nickel Oxide Thin Films for Hole‐Transport Layer Application in Perovskite Solar Cells
Vinoth Kumar, Sri Hari Bharath, Muydinov, Ruslan, Maticiuc, Natalia, Alktash, Nivin, Rusu, Marin, Seibertz, Bertwin Bilgrim Otto, Köbler, Hans, Abate, Antonio, Unold, Thomas, Lauermann, Iver, Szyszka, Bernd
Published in Advanced energy and sustainability research (01.04.2024)
Published in Advanced energy and sustainability research (01.04.2024)
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A Coaxial Nozzle Attachment Improving the Homogeneity of the Gas Flow Sputtering
Alktash, Nivin, Körner, Stefan, Liu, Tianhao, Pflug, Andreas, Szyszka, Bernd, Muydinov, Ruslan
Published in Coatings (Basel) (01.03.2024)
Published in Coatings (Basel) (01.03.2024)
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Water-assisted crystallization of amorphous indium zinc oxide films
Steigert, Alexander, Kojda, Danny, Ibaceta-Jaña, Josefa, Abou-Ras, Daniel, Gunder, René, Alktash, Nivin, Habicht, Klaus, Wagner, Markus R., Klenk, Reiner, Raoux, Simone, Szyszka, Bernd, Lauermann, Iver, Muydinov, Ruslan
Published in Materials today communications (01.06.2022)
Published in Materials today communications (01.06.2022)
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