Search Results - "Ablaza, Sheri L" :: K.UTB vyhledávací portál | TBU Library Retrieval Portal

Design and Chemistry of Advanced Deep-UV Photoresists: The Role of the Photoacid Generator

Design and Chemistry of Advanced Deep-UV Photoresists: The Role of the Photoacid Generator

by Cameron, James F., Ablaza, Sheri L., Xu, Guangyu, Yueh, Wang
Published in Journal of Photopolymer Science and Technology (1999)

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Journal Article

Quararibea Metabolites. 4. Total Synthesis and Conformational Studies of (±)-Funebrine and (±)-Funebral

Quararibea Metabolites. 4. Total Synthesis and Conformational Studies of (±)-Funebrine and (±)-Funebral

by Dong, Ying, Niranjan, Ablaza, Sheri L, Yu, Shao-Xia, Bolvig, Simon, Forsyth, David A, Le Quesne, Philip W
Published in Journal of organic chemistry (16.04.1999)

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Journal Article

PHOTORESIST COMPOSITIONS, METHOD OF FORMING A PHOTORESIST RELIEF IMAGE AND ARTICLE OF MANUFACTURE HAVING A COATING LAYER OF THE PHOTORESIST COMPOSITION

PHOTORESIST COMPOSITIONS, METHOD OF FORMING A PHOTORESIST RELIEF IMAGE AND ARTICLE OF MANUFACTURE HAVING A COATING LAYER OF THE PHOTORESIST COMPOSITION

by CAMERON JAMES W, ABLAZA SHERI L
Year of Publication 18.10.2010

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Patent

Photoresist compositions

Photoresist compositions

by CAMERON JAMES W, ABLAZA SHERI L
Year of Publication 09.05.2003

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Patent

Quararibea Metabolites. 4. 1 Total Synthesis and Conformational Studies of (±)-Funebrine and (±)-Funebral

Quararibea Metabolites. 4. 1 Total Synthesis and Conformational Studies of (±)-Funebrine and (±)-Funebral

by Dong, Ying, Niranjan, Ablaza, Sheri L., Yu, Shao-Xia, Bolvig, Simon, Forsyth, David A., Le Quesne, Philip W.
Published in Journal of organic chemistry (01.04.1999)

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Journal Article

Design and Chemistry of Advanced Deep-UV Photoresists

Design and Chemistry of Advanced Deep-UV Photoresists

by F. Cameron, James, L. Ablaza, Sheri, Xu, Guangyu, Yueh, Wang
Published in Journal of photopolymer science and technology (10.08.1999)

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Journal Article

Photoresist compositions

Photoresist compositions

by Cameron, James F, Ablaza, Sheri L
Year of Publication 01.06.2004

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Patent

Photoresist compositions

Photoresist compositions

by ABLAZA SHERI L, CAMERON JAMES F
Year of Publication 01.06.2004

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Patent

CHEMICALLY-AMPLIFIED POSITIVE PHOTORESIST COMPOSITION

CHEMICALLY-AMPLIFIED POSITIVE PHOTORESIST COMPOSITION

by CAMERON JAMES W, ABLAZA SHERI L
Year of Publication 27.06.2003

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Patent

Photoresist compositions

Photoresist compositions

by ABLAZA SHERI L, CAMERON JAMES F
Year of Publication 06.03.2003

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Patent

Photoresist compositions with si-component

Photoresist compositions with si-component

by ABLAZA SHERI L, SUZUKI YUSUHIRO, CAMERON JAMES F
Year of Publication 03.11.2005

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Patent

PHOTORESIST COMPOSITION CONTAINING Si-COMPONENT

PHOTORESIST COMPOSITION CONTAINING Si-COMPONENT

by YASUHIRO SUZUKI, ABLAZA SHERI L, JAMES F CAMERON
Year of Publication 18.08.2005

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Patent

POLYMER HAVING INERT BLOCKING GROUPS

POLYMER HAVING INERT BLOCKING GROUPS

by SINTA ROGER, ORSULA GEORGE W, THACKERAY JAMES W, ABLAZA SHERI L, DENISON MARK D
Year of Publication 26.10.2006

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Patent

PHOTORESIST COMPOSITIONS

PHOTORESIST COMPOSITIONS

by SHERI L. ABLAZA, JAMES F. CAMERON
Year of Publication 01.08.2008

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Patent

Radiation sensitive composition comprising polymer having inert blocking groups

Radiation sensitive composition comprising polymer having inert blocking groups

by THACKERAY, JAMES W, DENISON, MARK D, ORSULA, GEORGE W, SINTA, ROGER, ABLAZA, SHERI L
Year of Publication 03.03.2004

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Patent

Positive acid catalized resists

Positive acid catalized resists

by THACKERAY, JAMES W, DENISON, MARK D, ABLAZA, SHERI L, SINTA, ROGER F
Year of Publication 12.06.2002

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Patent

Positive acid catalyzed resists

Positive acid catalyzed resists

by SINTA; ROGER F, THACKERAY; JAMES W, DENISON; MARK D, ABLAZA; SHERI L
Year of Publication 27.10.1998

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Patent

Polymer for positive acid catalyzed resists

Polymer for positive acid catalyzed resists

by SINTA; ROGER F, THACKERAY; JAMES W, DENISON; MARK D, ABLAZA; SHERI L
Year of Publication 09.06.1998

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Patent

Polymer for positive acid catalyzed resists

Polymer for positive acid catalyzed resists

by SINTA; ROGER F, THACKERAY; JAMES W, DENISON; MARK D, ABLAZA; SHERI L
Year of Publication 24.03.1998

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Patent

Positive acid catalyzed resists having an alkali soluble resin with acid labile groups and inert blocking groups

Positive acid catalyzed resists having an alkali soluble resin with acid labile groups and inert blocking groups

by SINTA; ROGER F, THACKERAY; JAMES W, DENISON; MARK D, ABLAZA; SHERI L
Year of Publication 23.12.1997

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Patent