Diazonaphthoquinone Molecular Glass Photoresists: Patterning without Chemical Amplification
Bratton, Daniel, Ayothi, Ramakrishnan, Deng, Hai, Cao, Heidi B, Ober, Christopher K
Published in Chemistry of materials (24.07.2007)
Published in Chemistry of materials (24.07.2007)
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Sulfonium Salts of Alicyclic Group Functionalized Semifluorinated Alkyl Ether Sulfonates As Photoacid Generators
Yi, Yi, Ayothi, Ramakrishnan, Wang, Yueh, Li, Mingqi, Barclay, George, Sierra-Alvarez, Reyes, Ober, Christopher K
Published in Chemistry of materials (08.09.2009)
Published in Chemistry of materials (08.09.2009)
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Novel EUV Resist Development for Sub-14nm Half Pitch
Kimoto, Takakazu, Naruoka, Takehiko, Nakagawa, Hisashi, Fujisawa, Tomohisa, Shiratani, Motohiro, Nagai, Tomoki, Ayothi, Ramakrishnan, Hishiro, Yoshi, Hori, Masafumi, Hoshiko, Kenji, Kimura, Toru
Published in Journal of Photopolymer Science and Technology (01.01.2015)
Published in Journal of Photopolymer Science and Technology (01.01.2015)
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Novel EUV Resists Materials for 16nm HP and beyond
Sakai, Kazunori, Shiratani, Motohiro, Fujisawa, Tomohisa, Inukai, Koji, Sakai, Kaori, Maruyama, Ken, Hoshiko, Kenji, Ayothi, Ramakrishnan, Santos, Andreia, Naruoka, Takehiko, Nagai, Tomoki
Published in Journal of Photopolymer Science and Technology (01.01.2014)
Published in Journal of Photopolymer Science and Technology (01.01.2014)
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Non-ionic photo-acid generators for applications in two-photon lithography
STEIDL, Lorenz, JHAVERI, Shalin J, AYOTHI, Ramakrishnan, JING SHA, MCMULLEN, Jesse D, NG, Sin Yee Cindy, ZIPFEL, Warren R, ZENTEL, Rudolf, OBER, Christopher K
Published in Journal of materials chemistry (01.01.2009)
Published in Journal of materials chemistry (01.01.2009)
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New PFOS Free Photoresist Systems for EUV Lithography
Ayothi, Ramakrishnan, Chang, Seung Wook, Felix, Nelson, Cao, Heiji B., Deng, Hai, Yueh, Wang, Ober, Christopher K.
Published in Journal of Photopolymer Science and Technology (01.01.2006)
Published in Journal of Photopolymer Science and Technology (01.01.2006)
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Anti-Biofouling Properties of Comblike Block Copolymers with Amphiphilic Side Chains
Krishnan, Sitaraman, Ayothi, Ramakrishnan, Hexemer, Alexander, Finlay, John A., Sohn, Karen E., Perry, Ruth, Ober, Christopher K., Kramer, Edward J., Callow, Maureen E., Callow, James A., Fischer, Daniel A.
Published in Langmuir (23.05.2006)
Published in Langmuir (23.05.2006)
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