POSITIVE RESIST COMPOSITION AND RESIST PATTERN FORMING METHOD
ATSUJI KOTA, MUROI MASAAKI, OIKAWA SATORU, YAMADA MASAKAZU, SAISHO KENSUKE, TAKESHITA MASARU, NAKAMURA TAKAHIRO, YAMAGISHI TAKANORI
Year of Publication 24.11.2006
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Year of Publication 24.11.2006
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COPOLYMER FOR SEMICONDUCTOR LITHOGRAPHY, AND METHOD FOR PRODUCING THE SAME
ATSUJI KOTA, MUROI MASAAKI, OIKAWA SATORU, YAMADA MASAKAZU, SAISHO KENSUKE, TAKESHITA MASARU, YAMAGISHI TAKANORI, NAKAMURA TAKAHIRO
Year of Publication 24.11.2006
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Year of Publication 24.11.2006
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Process for refining crude resin for resist
HANEDA HIDEO,IWAI TAKESHI,MIYAIRI YOSHIKAZU,MUROIMASAAKI,ATSUJI KOTA,TOMITA HIROAKI
Year of Publication 15.03.2006
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Year of Publication 15.03.2006
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PROCESS FOR REFINING CRUDE RESIN FOR RESIST
ATSUJI KOTA, IWAI TAKESHI, MUROI MASAAKI, TOMITA HIROAKI, MIYAIRI YOSHIKAZU, HANEDA HIDEO
Year of Publication 14.07.2005
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Year of Publication 14.07.2005
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PURIFICATION METHOD FOR CRUDE RESIN TO BE USED AS ELECTRONIC MATERIAL
ATSUJI KOTA, IWAI TAKESHI, HAYASHI RYOTARO, MUROI MASAAKI, SHIOTANI KAZUYUKI, TAKESHITA MASARU, TOMITA HIROAKI, HANEDA HIDEO
Year of Publication 09.09.2004
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Year of Publication 09.09.2004
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METHOD FOR PURIFYING CRUDE RESIN FOR ELECTRONIC MATERIAL
ATSUJI KOTA, IWAI TAKESHI, HAYASHI RYOTARO, MUROI MASAAKI, SHIOTANI KAZUYUKI, TAKESHITA MASARU, TOMITA HIROAKI, HANEDA HIDEO
Year of Publication 19.08.2004
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Year of Publication 19.08.2004
Patent
Process for refining crude resin for resist
ATSUJI KOTA, IWAI TAKESHI, MUROI MASAAKI, TOMITA HIROAKI, MIYAIRI YOSHIKAZU, HANEDA HIDEO
Year of Publication 28.10.2009
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Year of Publication 28.10.2009
Patent