Deposition of HfO2, Gd2O3 and PrOx by Liquid Injection ALD Techniques
Potter, R. J., Chalker, P. R., Manning, T. D., Aspinall, H. C., Loo, Y. F., Jones, A. C., Smith, L. M., Critchlow, G. W., Schumacher, M.
Published in Chemical vapor deposition (01.03.2005)
Published in Chemical vapor deposition (01.03.2005)
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Journal Article
Atomic Layer Deposition and Properties of Lanthanum Oxide and Lanthanum-Aluminum Oxide Films
Kukli, K., Ritala, M., Pore, V., Leskelä, M., Sajavaara, T., Hegde, R. I., Gilmer, D. C., Tobin, P. J., Jones, A. C., Aspinall, H. C.
Published in Chemical vapor deposition (01.03.2006)
Published in Chemical vapor deposition (01.03.2006)
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Journal Article
Effect of deposition temperature on the properties of CeO2 films grown by atomic layer deposition
King, P.J., Werner, M., Chalker, P.R., Jones, A.C., Aspinall, H.C., Basca, J., Wrench, J.S., Black, K., Davies, H.O., Heys, P.N.
Published in Thin solid films (29.04.2011)
Published in Thin solid films (29.04.2011)
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Journal Article
Thermal Stability of Neodymium Aluminates High-κ Dielectric Deposited by Liquid Injection MOCVD Using Single-Source Heterometallic Alkoxide Precursors
Chen, Susu, Jones, A. C., Gaskell, J. M., Chalker, P. R., Werner, M., Taylor, S., Zhao, Ce Zhou, Taechakumput, P., Aspinall, H. C.
Published in Journal of nanomaterials (01.01.2012)
Published in Journal of nanomaterials (01.01.2012)
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Journal Article
Thermal Stability of Neodymium Aluminates High-[kappa] Dielectric Deposited by Liquid Injection MOCVD Using Single-Source Heterometallic Alkoxide Precursors
Taechakumput, P, Zhao, C Z, Taylor, S, Werner, M, Chalker, P R, Gaskell, J M, Aspinall, H C, Jones, A C, Chen, Susu
Published in Journal of nanomaterials (01.01.2012)
Published in Journal of nanomaterials (01.01.2012)
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Journal Article
Deposition of Lanthanum Zirconium Oxide High-k Films by Liquid Injection ALD and MOCVD
Gaskell, J. M., Jones, A. C., Chalker, P. R., Werner, M., Aspinall, H. C., Taylor, S., Taechakumput, P., Heys, P. N.
Published in Chemical vapor deposition (01.12.2007)
Published in Chemical vapor deposition (01.12.2007)
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Journal Article
Some recent developments in the MOCVD and ALD of high-κ dielectric oxides
JONES, Anthony C, ASPINALL, Helen C, CHALKER, Paul R, POTTER, Richard J, KUKLI, Kaupo, RAHTU, Antti, RITALA, Mikko, LESKELÄ, Markku
Published in Journal of materials chemistry (01.01.2004)
Published in Journal of materials chemistry (01.01.2004)
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Journal Article
MOCVD and ALD of High-k Dielectric Oxides Using Alkoxide Precursors
Jones, A. C., Aspinall, H. C., Chalker, P. R., Potter, R. J., Manning, T. D., Loo, Y. F., O'Kane, R., Gaskell, J. M., Smith, L. M.
Published in Chemical vapor deposition (01.03.2006)
Published in Chemical vapor deposition (01.03.2006)
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Journal Article
Growth of lanthanum oxide thin films by liquid injection MOCVD using a novel lanthanum alkoxide precursor
ASPINALL, Helen C, GASKELL, Jeffrey, WILLIAMS, Paul A, JONES, Anthony C, CHALKER, Paul R, MARSHALL, Paul A, SMITH, Lesley M, CRITCHLOW, Gary W
Published in Chemical vapor deposition (2004)
Published in Chemical vapor deposition (2004)
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Journal Article
Growth of Praseodymium Oxide Thin Films by Liquid Injection MOCVD Using a Novel Praseodymium Alkoxide Precursor
Aspinall, H.C., Gaskell, J., Williams, P.A., Jones, A.C., Chalker, P.R., Marshall, P.A., Bickley, J.F., Smith, L.M., Critchlow, G.W.
Published in Chemical vapor deposition (01.10.2003)
Published in Chemical vapor deposition (01.10.2003)
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Journal Article
Deposition of HfO2 Films by Liquid Injection MOCVD Using a New Monomeric Alkoxide Precursor, [Hf(dmop)4]
Loo, Y. F., O'Kane, R., Jones, A. C., Aspinall, H. C., Potter, R. J., Chalker, P. R., Bickley, J. F., Taylor, S., Smith, L. M.
Published in Chemical vapor deposition (01.07.2005)
Published in Chemical vapor deposition (01.07.2005)
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Journal Article
Lanthanide Pybox Complexes as Catalysts for Enantioselective Silylcyanation of Aldehydes
Aspinall, Helen C, Bickley, Jamie F, Greeves, Nicholas, Kelly, Richard V, Smith, Peter M
Published in Organometallics (04.07.2005)
Published in Organometallics (04.07.2005)
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Journal Article
Deposition of HfO 2 Films by Liquid Injection MOCVD Using a New Monomeric Alkoxide Precursor, [Hf(dmop) 4 ]
Loo, Y. F., O'Kane, R., Jones, A. C., Aspinall, H. C., Potter, R. J., Chalker, P. R., Bickley, J. F., Taylor, S., Smith, L. M.
Published in Chemical vapor deposition (01.07.2005)
Published in Chemical vapor deposition (01.07.2005)
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Journal Article
Recent developments in the MOCVD and ALD of rare earth oxides and silicates
Jones, Anthony C., Aspinall, Helen C., Chalker, Paul R., Potter, Richard J., Kukli, Kaupo, Rahtu, Antti, Ritala, Mikko, Leskelä, Markku
Published in Materials science & engineering. B, Solid-state materials for advanced technology (25.04.2005)
Published in Materials science & engineering. B, Solid-state materials for advanced technology (25.04.2005)
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