Antireflective hardmask and uses thereof
MEDEIROS DAVID R, BABICH KATHERINA, HUANG ELBERT, MAHOROWALA ARPAN P, TEMPLE KAREN, PFEIFFER DIRK
Year of Publication 06.02.2007
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Year of Publication 06.02.2007
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Antireflective hardmask and uses thereof
Babich, Katherina, Huang, Elbert, Mahorowala, Arpan P, Medeiros, David R, Pfeiffer, Dirk, Temple, Karen
Year of Publication 06.02.2007
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Year of Publication 06.02.2007
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Antireflective composition and process of making a lithographic structure
BURNS SEAN D, MAHOROWALA ARPAN P, TEMPLE KAREN, BABICH KATHERINA E, HUANG ELBERT E, PFEIFFER DIRK
Year of Publication 18.01.2007
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Year of Publication 18.01.2007
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Techniques for Patterning Features in Semiconductor Devices
HOLMES STEVEN J, MAHOROWALA ARPAN P, ALLEN SCOTT D, BABICH KATHERINA E, PFEIFFER DIRK, WISE RICHARD STEPHAN
Year of Publication 07.08.2008
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Year of Publication 07.08.2008
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ANTIREFLECTIVE SIO-CONTAINING COMPOSITIONS FOR HARDMASK LAYER
BROCK, PHILLIP, MAHOROWALA, ARPAN, P, MEDEIROS, DAVID, R, PFEIFFER, DIRK, HUANG, WU-SONG, SOORIYAKUMARAN, RATNAM, ANGELOPOULOS, MARIE, BABICH, KATHERINA
Year of Publication 03.06.2009
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Year of Publication 03.06.2009
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METHOD AND APPARATUS FOR MULTILAYER PHOTORESIST DRY DEVELOPMENT
MAHOROWALA, ARPAN, P, BALASUBRAMANIAM, VAIDYANATHAN, INAZAWA, KOICHIRO, PANDA, SIDDHARTHA, WISE, RICH
Year of Publication 28.12.2005
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Year of Publication 28.12.2005
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METHOD AND APPARATUS FOR MULTILAYER PHOTORESIST DRY DEVELOPMENT
INAZAWA KOICHIRO, MAHOROWALA ARPAN P, WISE RICH, BALASUBRAMANIAM VAIDYANATHAN, PANDA SIDDHARTHA
Year of Publication 29.11.2005
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Year of Publication 29.11.2005
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Methods and structures for protecting one area while processing another area on a chip
Kim, Deok-kee, Settlemyer, Jr, Kenneth T, Cheng, Kangguo, Divakaruni, Ramachandra, Radens, Carl J, Pfeiffer, Dirk, Dalton, Timothy, Babich, Katherina, Mahorowala, Arpan P, Okorn-Schmidt, Harald
Year of Publication 03.03.2009
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Year of Publication 03.03.2009
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Methods and structures for protecting one area while processing another area on a chip
DALTON TIMOTHY, SETTLEMYER, JR. KENNETH T, OKORN-SCHMIDT HARALD, KIM DEOK-KEE, BABICH KATHERINA, MAHOROWALA ARPAN P, DIVAKARUNI RAMACHANDRA, CHENG KANGGUO, RADENS CARL J, PFEIFFER DIRK
Year of Publication 03.03.2009
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Year of Publication 03.03.2009
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METHOD AND APPARATUS FOR ETCHING AN ORGANIC LAYER
PANDA,SIDDHARTHA, MAHOROWALA, ARPAN P, BALASUBRAMANIAM, VAIDYANATHAN, INAZAWA, KOICHIRO, WISE, RICH
Year of Publication 21.07.2005
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Year of Publication 21.07.2005
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Method and apparatus for etching an organic layer
INAZAWA KOICHIRO, MAHOROWALA ARPAN P, WISE RICH, BALASUBRAMANIAM VAIDYANATHAN, PANDA SIDDHARTHA
Year of Publication 23.06.2005
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Year of Publication 23.06.2005
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Methods and structures for protecting one area while processing another area on a chip
OKORN-SCHMIDT HARALD, KIM DEOK-KEE, BABICH KATHERINA, MAHOROWALA ARPAN P, DIVAKARUNI RAMACHANDRA, CHENG KANGGUO, RADENS CARL J, SETTLEMYER KENNETH T, PFEIFFER DIRK, DALTON THIMOTHY
Year of Publication 23.10.2008
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Year of Publication 23.10.2008
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In-situ plasma etch for TERA hard mask materials
MAHOROWALA ARPAN P, ALLEN SOCTT D, WISE RICHARD S, DESHPANDE SADANAND V, YAN WENDY
Year of Publication 07.06.2005
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Year of Publication 07.06.2005
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In-situ plasma etch for TERA hard mask materials
Wise, Richard S, Deshpande, Sadanand V, Yan, Wendy, Allen, Soctt D, Mahorowala, Arpan P
Year of Publication 07.06.2005
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Year of Publication 07.06.2005
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SILICON-CONTAINING COMPOSITION FOR SPIN-ON ANTIREFLECTION COATING (ARC)/HARD MASK
HUANG WU-SONG, MAHOROWALA ARPAN P, RATONAMU SOORIYAKUMARAN, PFEIFFER DIRK, ANGELOPOULOS MARIE, MOREAU WAYNE
Year of Publication 28.04.2005
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Year of Publication 28.04.2005
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