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"ARORA, RIKHIT"
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"ARORA, RIKHIT"
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A mathematical model for chemical vapor deposition processes influenced by surface reaction kinetics : application to low-pressure deposition of tungsten
by
ARORA, R
,
POLLARD, R
Published in
Journal of the Electrochemical Society
(01.05.1991)
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Re-based alloys usable as deposition targets for forming interlayers in granular perpendicular magnetic recording media & media utilizing said alloys
by
ARORA
,
RIKHIT
,
DAS, ANIRBAN
,
RACINE, MICHAEL GENE
,
IMAKAWA, MAKOTO
,
KENNEDY, STEVEN ROGER
Year of Publication
10.09.2008
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RE-BASED ALLOYS USABLE AS DEPOSITION TARGETS FOR FORMING INTERLAYERS IN GRANULAR PERPENDICULAR MAGNETIC RECORDING MEDIA & MEDIA UTILIZING SAID ALLOYS
by
KENNEDY STEVEN ROGER
,
ARORA RIKHIT
,
DAS ANIRBAN
,
RACINE MICHAEL GENE
,
IMAKAWA MAKOTO
Year of Publication
28.08.2008
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Re-based alloys usable as deposition targets for forming interlayers in granular perpendicular magnetic recording media & media utilizing said alloys
by
ARORA
,
RIKHIT
,
DAS, ANIRBAN
,
RACINE, MICHAEL GENE
,
IMAKAWA, MAKOTO
,
KENNEDY, STEVEN ROGER
Year of Publication
13.08.2008
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RHENIUM(Re)-BASED ALLOY USABLE AS DEPOSITION TARGET FOR FORMING INTERLAYER IN GRANULAR PERPENDICULAR MAGNETIC RECORDING MEDIA AND MEDIA UTILIZING ALLOY
by
KENNEDY STEVEN ROGER
,
ARORA RIKHIT
,
DAS ANIRBAN
,
IMAKAWA MAKOTO
,
RACINE MICHAEL G
Year of Publication
24.07.2008
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RE-BASED ALLOYS USABLE AS DEPOSITION TARGETS FOR FORMING INTERLAYERS IN GRANULAR PERPENDICULAR MAGNETIC RECORDING MEDIA AND MEDIA UTILIZING SAID ALLOYS
by
KENNEDY STEVEN ROGER
,
ARORA RIKHIT
,
DAS ANIRBAN
,
RACINE MICHAEL GENE
,
IMAKAWA MAKOTO
Year of Publication
11.07.2008
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RE-BASED ALLOYS USABLE AS DEPOSITION TARGETS FOR FORMING INTERLAYERS IN GRANULAR PERPENDICULAR MAGNETIC RECORDING MEDIA & MEDIA UTILIZING SAID ALLOYS
by
KENNEDY STEVEN ROGER
,
ARORA RIKHIT
,
DAS ANIRBAN
,
RACINE MICHAEL GENE
,
IMAKAWA MAKOTO
Year of Publication
10.07.2008
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Patent
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VERFAHREN ZUR PLASMA AKTIVIERTEN WÄRMEBEHANDLUNG VON TITANNITRID
by
ARORA
,
RIKHIT
,
FOSTER, ROBERT
,
HILLMAN, JOSEPH
Year of Publication
03.02.2000
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Method and apparatus for low temperature deposition of CVD and PECVD films
by
HILLMAN; JOSEPH T
,
FOSTER; ROBERT F
,
ARORA
;
RIKHIT
Year of Publication
31.10.2000
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PROCESS FOR PLASMA ENHANCED ANNEAL OF TITANIUM NITRIDE
by
HILLMAN, JOSEPH, T
,
ARORA
,
RIKHIT
,
FOSTER, ROBERT, F
Year of Publication
14.07.1999
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METHOD AND APPARATUS FOR LOW TEMPERATURE DEPOSITION OF CVD AND PECVD FILMS
by
HILLMAN, JOSEPH, T
,
ARORA
,
RIKHIT
,
FOSTER, ROBERT, F
Year of Publication
28.10.1998
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PROCESS FOR PLASMA ENHANCED ANNEAL OF TITANIUM NITRIDE
by
HILLMAN, JOSEPH, T
,
ARORA
,
RIKHIT
,
FOSTER, ROBERT, F
Year of Publication
01.04.1998
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Déposition chimique en phase vapeur de nitrure de titane assistée par plasma en utilisant de l'ammoniac
by
RIKHIT ARORA
,
JOSEPH T. HILLMAN
,
ROBERT F. FOSTER
Year of Publication
27.11.1997
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Method and apparatus for low temperature deposition of CVD and PECVD films
by
HILLMAN; JOSEPH T
,
FOSTER; ROBERT F
,
ARORA
;
RIKHIT
Year of Publication
13.05.1997
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METHOD AND APPARATUS FOR LOW TEMPERATURE DEPOSITION OF CVD AND PECVD FILMS
by
HILLMAN, JOSEPH, T
,
ARORA
,
RIKHIT
,
FOSTER, ROBERT, F
Year of Publication
19.03.1997
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Plasma enhanced chemical vapor deposition of titanium nitride using ammonia
by
HILLMAN; JOSEPH T
,
FOSTER; ROBERT F
,
ARORA
;
RIKHIT
Year of Publication
11.03.1997
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Process for plasma enhanced anneal of titanium nitride
by
RIKHIT ARORA
,
ROBERT F FOSTER
,
JOSEPH T HILLMAN
Year of Publication
24.12.1996
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PROCESS FOR PLASMA ENHANCED ANNEAL OF TITANIUM NITRIDE
by
HILLMAN, JOSEPH, T
,
ARORA
,
RIKHIT
,
FOSTER, ROBERT, F
Year of Publication
12.12.1996
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PROCESS FOR PLASMA ENHANCED ANNEAL OF TITANIUM NITRIDE
by
HILLMAN, JOSEPH T
,
FOSTER, ROBERT F
,
ARORA
,
RIKHIT
Year of Publication
12.12.1996
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Process for plasma enhanced anneal of titanium nitride
by
HILLMAN; JOSEPH T
,
FOSTER; ROBERT F
,
ARORA
;
RIKHIT
Year of Publication
22.10.1996
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