Wafer Edge Protection Layer: A Solution for Metal Contamination Issue in Advanced Patterning Process
Kudo, Takanori, Cho, JoonYeon, Hishida, Aritaka, Mullen, Salem, Wolfer, Elizabeth, Polishchuk, Orest, Antonio, Charito, Li, Zhong
Published in Journal of Photopolymer Science and Technology (25.06.2024)
Published in Journal of Photopolymer Science and Technology (25.06.2024)
Get full text
Journal Article
Spin-on Metal Oxide Hard Mask as Underlayer for EUV Lithography with Chemically Amplified Resist
Li, Zhong, Kampitakisa, Viktor, Her, Youngjun, Antonio, Charito, Kudo, Takanori, Mullen, Salem, Muthuswamy, Elayaraja, Polishchuk, Orest, Ware, Adam, Wolfer, Elizabeth, Yang, Dong, Cho, JoonYeon, Hishida, Aritaka
Published in Journal of Photopolymer Science and Technology (25.06.2024)
Published in Journal of Photopolymer Science and Technology (25.06.2024)
Get full text
Journal Article
NEGATIVE-WORKING ULTRA THICK FILM PHOTORESIST
LU, Lei, HISHIDA, Aritaka, LU, PingHung, LIU, Weihong, MOTOBAYASHI, Hisashi, CHEN, Chunwei
Year of Publication 20.03.2024
Get full text
Year of Publication 20.03.2024
Patent
Negative-working ultra thick film photoresist
Lu, Lei, Motobayashi, Hisashi, Chen, Chunwei, Liu, Weihong, Hishida, Aritaka, Lu, PingHung
Year of Publication 11.07.2023
Get full text
Year of Publication 11.07.2023
Patent
POLYMER, SEMICONDUCTOR COMPOSITION COMPRISING POLYMER, AND METHOD FOR MANUFACTURING FILM USING SEMICONDUCTOR COMPOSITION
HISHIDA, Aritaka, KOZAKI, Rikio, KATAYAMA, Tomohide, HITOKAWA, Hiroshi, SUZUKI, Masato, ZHANG, Rul, OKAMURA, Toshiya, YANO, Tomotsugu
Year of Publication 21.04.2022
Get full text
Year of Publication 21.04.2022
Patent
POLYMER, SEMICONDUCTOR COMPOSITION COMPRISING POLYMER, AND METHOD FOR MANUFACTURING FILM USING SEMICONDUCTOR COMPOSITION
HISHIDA, Aritaka, KOZAKI, Rikio, KATAYAMA, Tomohide, HITOKAWA, Hiroshi, ZHANG, Rui, SUZUKI, Masato, OKAMURA, Toshiya, YANO, Tomotsugu
Year of Publication 29.12.2021
Get full text
Year of Publication 29.12.2021
Patent
POLYMER, SEMICONDUCTOR COMPOSITION COMPRISING POLYMER, AND METHOD FOR MANUFACTURING FILM USING SEMICONDUCTOR COMPOSITION
HISHIDA, Aritaka, KOZAKI, Rikio, KATAYAMA, Tomohide, HITOKAWA, Hiroshi, ZHANG, Rui, SUZUKI, Masato, OKAMURA, Toshiya, YANO, Tomotsugu
Year of Publication 29.09.2021
Get full text
Year of Publication 29.09.2021
Patent
Positive working photosensitive material
Lai, SookMee, Chen, Chunwei, Liu, Weihong, Sakurai, Yoshiharu, Hishida, Aritaka, Lu, PingHung
Year of Publication 13.04.2021
Get full text
Year of Publication 13.04.2021
Patent
NEGATIVE-WORKING ULTRA THICK FILM PHOTORESIST
LU, Lei, HISHIDA, Aritaka, LU, PingHung, LIU, Weihong, MOTOBAYASHI, Hisashi, CHEN, Chunwei
Year of Publication 27.01.2021
Get full text
Year of Publication 27.01.2021
Patent
NEGATIVE-WORKING ULTRA THICK FILM PHOTORESIST
LU, Lei, HISHIDA, Aritaka, LU, PingHung, LIU, Weihong, MOTOBAYASHI, Hisashi, CHEN, Chunwei
Year of Publication 17.12.2020
Get full text
Year of Publication 17.12.2020
Patent
NEGATIVE-WORKING ULTRA THICK FILM PHOTORESIST
LU, Lei, HISHIDA, Aritaka, LU, PingHung, LIU, Weihong, MOTOBAYASHI, Hisashi, CHEN, Chunwei
Year of Publication 28.08.2020
Get full text
Year of Publication 28.08.2020
Patent
POLYMER, SEMICONDUCTOR COMPOSITION COMPRISING POLYMER, AND METHOD FOR MANUFACTURING FILM USING SEMICONDUCTOR COMPOSITION
HISHIDA, Aritaka, KOZAKI, Rikio, KATAYAMA, Tomohide, HITOKAWA, Hiroshi, ZHANG, Rui, SUZUKI, Masato, OKAMURA, Toshiya, YANO, Tomotsugu
Year of Publication 27.08.2020
Get full text
Year of Publication 27.08.2020
Patent
POSITIVE WORKING PHOTOSENSITIVE MATERIAL
HISHIDA, Aritaka, LAI, SookMee, SAKURAI, Yoshiharu, LU, PingHung, LIU, Weihong, CHEN, Chunwei
Year of Publication 01.04.2020
Get full text
Year of Publication 01.04.2020
Patent
POSITIVE WORKING PHOTOSENSITIVE MATERIAL
HISHIDA, Aritaka, LAI, SookMee, SAKURAI, Yoshiharu, TOUKHY, Medhat A, LU, PingHung, LIU, Weihong
Year of Publication 18.03.2020
Get full text
Year of Publication 18.03.2020
Patent
NEGATIVE-WORKING ULTRA THICK FILM PHOTORESIST
LU, Lei, HISHIDA, Aritaka, LU, PingHung, LIU, Weihong, MOTOBAYASHI, Hisashi, CHEN, Chunwei
Year of Publication 26.09.2019
Get full text
Year of Publication 26.09.2019
Patent
TWI838462B
SUZUKI, MASATO, KOZAKI, RIKIO, OKAMURA, TOSHIYA, KATAYAMA, TOMOHIDE, YANO, TOMOTSUGU, ZHANG, RUI, HITOKAWA, HIROSHI, HISHIDA, ARITAKA
Year of Publication 11.04.2024
Get full text
Year of Publication 11.04.2024
Patent
POSITIVE WORKING PHOTOSENSITIVE MATERIAL
HISHIDA, Aritaka, LAI, SookMee, SAKURAI, Yoshiharu, LU, PingHung, LIU, Weihong, CHEN, Chunwei
Year of Publication 28.02.2019
Get full text
Year of Publication 28.02.2019
Patent
POSITIVE WORKING PHOTOSENSITIVE MATERIAL
HISHIDA, Aritaka, LAI, SookMee, SAKURAI, Yoshiharu, LU, PingHung, LIU, Weihong, CHEN, Chunwei
Year of Publication 27.02.2019
Get full text
Year of Publication 27.02.2019
Patent
POSITIVE WORKING PHOTOSENSITIVE MATERIAL
HISHIDA, Aritaka, LAI, SookMee, SAKURAI, Yoshiharu, LU, PingHung, LIU, Weihong, CHEN, Chunwei
Year of Publication 28.01.2019
Get full text
Year of Publication 28.01.2019
Patent
Negative-working ultra thick film photoresist composition and process for forming image in coating
LU, PINGHUNG, LU, LEI, LIU, WEIHONG, MOTOBAYASHI, HISASHI, CHEN, CHUNWEI, HISHIDA, ARITAKA
Year of Publication 21.10.2023
Get full text
Year of Publication 21.10.2023
Patent