Improvements in the physical properties of UV-curable coating by utilizing type II photoinitiator
Sanai, Yasuyuki, Ninomiya, Takeru, Arimitsu, Koji
Published in Progress in organic coatings (01.02.2021)
Published in Progress in organic coatings (01.02.2021)
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Journal Article
Photoadhesive Materials Containing 2-Mercaptopyridyl Moieties
Furutani, Masahiro, Fujihira, Daiki, Arimitsu, Koji
Published in Journal of Photopolymer Science and Technology (01.07.2020)
Published in Journal of Photopolymer Science and Technology (01.07.2020)
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Journal Article
Role of dipyridyl disulfide cross-linking moieties in an acrylate photo-adhesive material
Furutani, Masahiro, Nakayama, Kentaro, Okuma, Kazuki, Arimitsu, Koji
Published in Journal of polymer research (01.06.2022)
Published in Journal of polymer research (01.06.2022)
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Journal Article
Photoresist materials comprising photobase generators and epoxy resins bearing carboxylic acids to lead to marked enhancement of base‐catalyzed cross‐linking reactions
Terada, Kiwamu, Furutani, Masahiro, Arimitsu, Koji
Published in Polymers for advanced technologies (01.02.2019)
Published in Polymers for advanced technologies (01.02.2019)
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Journal Article
Relief of Shrinkage of UV-cured Materials by Exchange Reactions of Disulfide Bonds
Furutani, Masahiro, Okuma, Kazuki, Arimitsu, Koji
Published in Journal of Photopolymer Science and Technology (24.06.2019)
Published in Journal of Photopolymer Science and Technology (24.06.2019)
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Journal Article
Photoadhesive of Acrylates Containing Cross-links of Dipyridyl Disulfide
Furutani, Masahiro, Nakayama, Kentaro, Okuma, Kazuki, Arimitsu, Koji
Published in Journal of Photopolymer Science and Technology (24.06.2019)
Published in Journal of Photopolymer Science and Technology (24.06.2019)
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Journal Article
Structural Analysis of Ionic Photobase Generators and Lithographic Patterning of Polysilane Films Containing the Photobase Generators
Noda, Kunihiro, Kikuchi, Shun, Ikuma, Naohiko, Shiota, Dai, Furutani, Masahiro, Arimitsu, Koji
Published in Journal of Photopolymer Science and Technology (24.06.2019)
Published in Journal of Photopolymer Science and Technology (24.06.2019)
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Journal Article
Behavior of Si-Si Bond Oxidation by Electron Beam Lithography
Noda, Kunihiro, Seshimo, Takehiro, Suzuki, Issei, Misumi, Kouichi, Shiota, Dai, Kikuchi, Shun, Furutani, Masahiro, Arimitsu, Koji
Published in Journal of Photopolymer Science and Technology (25.06.2018)
Published in Journal of Photopolymer Science and Technology (25.06.2018)
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Journal Article
Photochemical Generation of Superbases and Its Application to Photoreactive Materials
Arimitsu, Koji, Endo, Ryosuke
Published in Journal of Photopolymer Science and Technology (01.01.2010)
Published in Journal of Photopolymer Science and Technology (01.01.2010)
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Journal Article
A cinnamic acid-type photo-cleavable surfactant
Sakai, Hideki, Aikawa, Shohei, Matsuda, Wataru, Ohmori, Takashi, Fukukita, Yuko, Tezuka, Yoji, Matsumura, Atsutoshi, Torigoe, Kanjiro, Tsuchiya, Koji, Arimitsu, Koji, Sakamoto, Kazutami, Sakai, Kenichi, Abe, Masahiko
Published in Journal of colloid and interface science (15.06.2012)
Published in Journal of colloid and interface science (15.06.2012)
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Preparation and properties of flexible free-standing films via polyalkoxysiloxanes by acid-catalyzed controlled hydrolytic polycondensation of tetraethoxysilane and tetramethoxysilane
Gunji, Takahiro, Hayashi, Yuki, Komatsubara, Akemi, Arimitsu, Koji, Abe, Yoshimoto
Published in Applied organometallic chemistry (01.01.2012)
Published in Applied organometallic chemistry (01.01.2012)
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