Role of surface-reaction layer in HBr/fluorocarbon-based plasma with nitrogen addition formed by high-aspect-ratio etching of polycrystalline silicon and SiO2 stacks
Iwase, Taku, Matsui, Miyako, Yokogawa, Kenetsu, Arase, Takao, Mori, Masahito
Published in Japanese Journal of Applied Physics (01.06.2016)
Published in Japanese Journal of Applied Physics (01.06.2016)
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Journal Article
Role of surface-reaction layer in HBr/fluorocarbon-based plasma with nitrogen addition formed by high-aspect-ratio etching of polycrystalline silicon and SiO 2 stacks
Iwase, Taku, Matsui, Miyako, Yokogawa, Kenetsu, Arase, Takao, Mori, Masahito
Published in Japanese Journal of Applied Physics (01.06.2016)
Published in Japanese Journal of Applied Physics (01.06.2016)
Get full text
Journal Article
Role of surface-reaction layer in HBr/fluorocarbon-based plasma with nitrogen addition formed by high-aspect-ratio etching of polycrystalline silicon and SiO sub(2) stacks
Iwase, Taku, Matsui, Miyako, Yokogawa, Kenetsu, Arase, Takao, Mori, Masahito
Published in Japanese Journal of Applied Physics (01.06.2016)
Published in Japanese Journal of Applied Physics (01.06.2016)
Get full text
Journal Article
플라스마 처리 장치 및 플라스마 처리 방법
IWASE TAKU, MORI MASAHITO, WATANABE HAYATO, ARASE TAKAO, TERAKURA SATOSHI
Year of Publication 07.05.2020
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Year of Publication 07.05.2020
Patent
PLASMA PROCESSING APPARATUS
ISOZAKI SHINICHI, YOKOGAWA KENETSU, SAKAI YOSUKE, ARASE TAKAO, MORI MASASHI
Year of Publication 22.07.2019
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Year of Publication 22.07.2019
Patent
PLASMA PROCESSING APPARATUS
ISOZAKI MASAKAZU, SAKAI YOUSUKE, MORI MASAHITO, YOKOGAWA KENETSU, ARASE TAKAO
Year of Publication 19.07.2019
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Year of Publication 19.07.2019
Patent
PLASMA PROCESSING DEVICE, AND PLASMA PROCESSING METHOD
TERAKURA Satoshi, WATANABE Hayato, IWASE Taku, MORI Masahito, ARASE Takao
Year of Publication 18.07.2019
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Year of Publication 18.07.2019
Patent