Directed Self Assembly Materials for Hole Patterning
Minegishi, Shinya, Anno, Yusuke, Namie, Yuji, Nagai, Tomoki
Published in Journal of Photopolymer Science and Technology (01.01.2012)
Published in Journal of Photopolymer Science and Technology (01.01.2012)
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Material Development for ArF Immersion Resist Extension
Kasahara, Kazuyuki, Anno, Yusuke, Shima, Motoyuki
Published in Journal of Photopolymer Science and Technology (01.01.2011)
Published in Journal of Photopolymer Science and Technology (01.01.2011)
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Journal Article
Directed Self Assembly Material Development for Fine Patterning and Pattern Repair
Minegishi, Shinya, Namie, Yuji, Izumi, Kenichi, Anno, Yusuke, Buch, Xavier, Naruoka, Takehiko, Hishiro, Yoshi, Nagai, Tomoki
Published in Journal of Photopolymer Science and Technology (01.01.2013)
Published in Journal of Photopolymer Science and Technology (01.01.2013)
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Journal Article
Double Patterning Materials for Sub-40nm Application
Anno, Yusuke, Kakizawa, Tomohiro, Hori, Masafumi, Soyano, Akimasa, Fujiwara, Koichi, Nakamura, Atsushi, Sugiura, Makoto, Yamaguchi, Yoshikazu, Shimokawa, Tsutomu
Published in Journal of Photopolymer Science and Technology (01.01.2008)
Published in Journal of Photopolymer Science and Technology (01.01.2008)
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Journal Article
Non Topcoat Self-freezing Photoresist for Double Patterning Process
Ito, Koji, Mita, Michihiro, Wakamatsu, Goji, Anno, Yusuke, Fujisawa, Tomohisa, Osaki, Hitoshi, Hoshiko, Kenji, Tanaka, Hiromitsu, Nishimura, Yukio, Sugiura, Makoto, Yamaguchi, Yoshikazu, Shimokawa, Tsutomu
Published in Journal of Photopolymer Science and Technology (01.01.2010)
Published in Journal of Photopolymer Science and Technology (01.01.2010)
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Journal Article
Freezing Material Development for Double Patterning Process
Kakizawa, Tomohiko, Wakamatsu, Goji, Anno, Yusuke, Hori, Masafumi, Mita, michihiro, Hoshiko, Kenji, Shio, Takeo, Fujiwara, Koichi, Kusumoto, Shiro, Yamaguchi, Yoshikazu, Shimokawa, Tsutomu
Published in Journal of Photopolymer Science and Technology (01.01.2009)
Published in Journal of Photopolymer Science and Technology (01.01.2009)
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Journal Article
SILICON-CONTAINING COMPOSITION AND METHOD FOR PRODUCING SEMICONDUCTOR SUBSTRATE
NII, Akitaka, SEKO, Tomoaki, NEMOTO, Ryuichi, ANNO, Yusuke, NISHIMURA, Souta
Year of Publication 02.06.2022
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Year of Publication 02.06.2022
Patent
조성물, 규소 함유막, 규소 함유막의 형성 방법 및 반도체 기판의 처리 방법
SEKO TOMOAKI, MATSUKI TOMOHIRO, SAKAI TATSUYA, KASAI TATSUYA, ANNO YUSUKE
Year of Publication 01.04.2022
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Year of Publication 01.04.2022
Patent