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Published in Proceedings of the National Academy of Sciences - PNAS (13.04.1999)
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Synthesis and Histone Deacetylase Inhibitory Activity of New Benzamide Derivatives
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Published in Journal of medicinal chemistry (29.07.1999)
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Proton Dynamics in Chemically Amplified Electron Beam Resists
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Published in Japanese Journal of Applied Physics (01.07.2004)
Published in Japanese Journal of Applied Physics (01.07.2004)
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Potential Cause of Inhomogeneous Acid Distribution in Chemically Amplified Resists for Post Optical Lithography
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Published in Japanese Journal of Applied Physics (01.07.2005)
Published in Japanese Journal of Applied Physics (01.07.2005)
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Pattern Freezing Process Free Litho–Litho–Etch Double Patterning
Ando, Tomoyuki, Takeshita, Masaru, Takasu, Ryoichi, Yoshii, Yoshihiro, Iwashita, Jun, Matsumaru, Shogo, Abe, Sho, Iwai, Takeshi
Published in Japanese Journal of Applied Physics (01.06.2009)
Published in Japanese Journal of Applied Physics (01.06.2009)
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Reaction Mechanisms of Brominated Chemically Amplified Resists
Yamamoto, Hiroki, Kozawa, Takahiro, Nakano, Atsuro, Okamoto, Kazumasa, Tagawa, Seiichi, Ando, Tomoyuki, Sato, Mitsuru, Komano, Hiroji
Published in Japanese Journal of Applied Physics (01.01.2005)
Published in Japanese Journal of Applied Physics (01.01.2005)
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Ammonia-treated carbon-supported cobalt tungsten as fuel cell cathode catalyst
Ando, Tomoyuki, Izhar, Shamsul, Tominaga, Hiroyuki, Nagai, Masatoshi
Published in Electrochimica acta (01.03.2010)
Published in Electrochimica acta (01.03.2010)
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Characteristics of ArF Immersion Lithography Using Topcoat
Ishibashi, Takeo, Hanawa, Tetsuro, Suganaga, Tsohifumi, Maejima, Shinroku, Narimatsu, Koichiro, Suko, Kazuyuki, Terai, Mamoru, Kumada, Teruhiko, Ando, Tomoyuki
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Published in Journal of Photopolymer Science and Technology (01.01.2006)
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Organic Damascene Process for 1.5- \mu m Panel-Scale Redistribution Layer Technology Using 5- \mu m-Thick Dry Film Photosensitive Dielectrics
Fuhan Liu, Nair, Chandrasekharan, Kubo, Atsushi, Ando, Tomoyuki, Wei, Frank, Sundaram, Venky, Tummala, Rao R.
Published in IEEE transactions on components, packaging, and manufacturing technology (2011) (01.05.2018)
Published in IEEE transactions on components, packaging, and manufacturing technology (2011) (01.05.2018)
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Organic Damascene Process for 1.5-[Formula Omitted]m Panel-Scale Redistribution Layer Technology Using 5-[Formula Omitted]m-Thick Dry Film Photosensitive Dielectrics
Liu, Fuhan, Nair, Chandrasekharan, Kubo, Atsushi, Ando, Tomoyuki, Wei, Frank, Sundaram, Venky, Tummala, Rao R
Published in IEEE transactions on components, packaging, and manufacturing technology (2011) (01.01.2018)
Published in IEEE transactions on components, packaging, and manufacturing technology (2011) (01.01.2018)
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