Search Results - "ANDERL WILLI" :: K.UTB vyhledávací portál

Optical component having an improved transient thermal behavior and method for improving the transient thermal behavior of an optical component

by Egle, Wilhelm, Hafner, Wolfgang, Anderl, Willi, Bingel, Ulrich, Muenz, Holger, Neidhardt, Thomas
Year of Publication 21.06.2011

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REFLECTIVE OPTICAL ELEMENT FOR USE IN EUV SYSTEM

by KIEREY HOLGER, MAIRE MICHEL LE, LENGEL ANTON, ANDERL WILLI, HOLDERER HUBERT
Year of Publication 17.03.2011

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REFLECTIVE OPTICAL ELEMENT FOR USE IN AN EUV SYSTEM

by LE MAIRE MICHEL, KIEREY HOLGER, LENGEL ANTON, ANDERL WILLI, HOLDERER HUBERT
Year of Publication 03.03.2011

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Kühlvorrichtung mit Kühlkörper und Projektionsbelichtungsanlage für die Halbleiterlithographie

by Weigl, Bernhard, Kolloch, Andreas, Anderl, Willi, Kierey, Holger, Bauer, Markus, Wandner, Ann-Kathrin, Schmittner, Arno, Schmelzeisen, Marcus
Year of Publication 17.08.2017

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Optical component having an improved transient thermal behavior and method for improving the transient thermal behavior of an optical component

by Egle, Wilhelm, Hafner, Wolfgang, Anderl, Willi, Bingel, Ulrich, Muenz, Holger, Neidhardt, Thomas
Year of Publication 27.01.2009

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Optical component having an improved transient thermal behavior and method for improving the transient thermal behavior of an optical component

by HAFNER WOLFGANG, BINGEL ULRICH, NEIDHARDT THOMAS, EGLE WILHELM, ANDERL WILLI, MUENZ HOLGER
Year of Publication 27.01.2009

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Optical Component Having an Improved Transient Thermal Behavior and Method for Improving the Transient Thermal Behavior of an Optical Component

by HAFNER WOLFGANG, BINGEL ULRICH, NEIDHARDT THOMAS, EGLE WILHELM, ANDERL WILLI, MUENZ HOLGER
Year of Publication 22.01.2009

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APPARATUS FOR LASER ANNEALING OF LARGE SUBSTRATES AND METHOD FOR LASER ANNEALING OF LARGE SUBSTRATES

by EGGER, RAFAEL, TRITSCHLER, THORSTEN, ZENZINGER, MARKUS, WALTHER, JOERG, MARCZUK, PIOTR, ANDERL, WILLI, SEIFERT, WOLFGANG
Year of Publication 07.01.2009

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APPARATUS FOR LASER ANNEALING OF LARGE SUBSTRATES AND METHOD FOR LASER ANNEALING OF LARGE SUBSTRATES

by EGGER RAFAEL, MARCZUK PIOTR, SEIFERT WOLFGANG, TRITSCHLER THORSTEN, WALTHER JORG, ZENZINGER MARKUS, ANDERL WILLI
Year of Publication 26.12.2008

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APPARATUS FOR LASER ANNEALING OF LARGE SUBSTRATES AND METHOD FOR LASER ANNEALING OF LARGE SUBSTRATES

by EGGER RAFAEL, MARCZUK PIOTR, SEIFERT WOLFGANG, TRITSCHLER THORSTEN, WALTHER JORG, ZENZINGER MARKUS, ANDERL WILLI
Year of Publication 26.12.2008

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Optical element i.e. mirror, supporting device for fusion of silicon layer on substrate, has elastic units formed as monopods, and optical element and area elongated in square-shaped manner with preset aspect ratio

by MOSER, RALF, LE MAIRE, MICHEL, KIEREY, HOLGER, ACKVA, J, HOESS, CHRISTIAN, HUELL, JOHANN, ANDERL, WILLI
Year of Publication 04.02.2010

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Kühler zur Verwendung in einer Vorrichtung im Vakuum

by Weigl, Bernhard, Kolloch, Andreas, Anderl, Willi, Kierey, Holger, Bauer, Markus, Wandner, Ann-Kathrin, Schmittner, Arno, Schmelzeisen, Marcus
Year of Publication 25.05.2016

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APPARATUS FOR LASER ANNEALING OF LARGE SUBSTRATES AND METHOD FOR LASER ANNEALING OF LARGE SUBSTRATES

by EGGER, RAFAEL, TRITSCHLER, THORSTEN, ZENZINGER, MARKUS, WALTHER, JOERG, MARCZUK, PIOTR, ANDERL, WILLI, SEIFERT, WOLFGANG
Year of Publication 01.11.2007

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OPTICAL COMPONENT, INPARTICULAR COLLECTOR FOR USE IN EUV LITHOGRAPHY

by KUHN, JOCHEN, MARCZUK, PIOTR, ANDERL, WILLI, WEIGL, BERNHARD, BINGEL, ULRICH, HAFNER, WOLFGANG, DINGER, UDO, MATTHES, AXEL
Year of Publication 10.05.2007

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