SPACER AND PROCESS TO ENHANCE THE STRAIN IN THE CHANNEL WITH STRESS LINER
AJMERA ATUL C, GAO WENZHI, BAIOCCO CHRISTOPHER V, CHEN XIANGDONG, TEH YOUNG W
Year of Publication 03.10.2013
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Year of Publication 03.10.2013
Patent
Spacer and process to enhance the strain in the channel with stress liner
AJMERA ATUL C, GAO WENZHI, BAIOCCO CHRISTOPHER V, CHEN XIANGDONG, TEH YOUNG WAY
Year of Publication 11.06.2013
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Year of Publication 11.06.2013
Patent
SPACER AND PROCESS TO ENHANCE THE STRAIN IN THE CHANNEL WITH STRESS LINER
AJMERA ATUL C, GAO WENZHI, BAIOCCO CHRISTOPHER V, CHEN XIANGDONG, TEH YOUNG WAY
Year of Publication 30.08.2007
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Year of Publication 30.08.2007
Patent
CMOS structure with non-epitaxial raised source/drain and self-aligned gate and method of manufacture
SHAHIDI, GHAVAM G, ASSADERAGHI, FARIBORZ, AJMERA, ATUL C, PARK, HEEMYONG
Year of Publication 11.11.2003
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Year of Publication 11.11.2003
Patent
Method of forming an oxide film on a gate side wall of a gate structure
Ajmera, Atul C, Balasubramanyam, Karanam, Katata, Tomio, Ko, Shang-Bin
Year of Publication 12.08.2003
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Year of Publication 12.08.2003
Patent
CMOS structure with non-epitaxial raised source/drain and self-aligned gate and method of manufacture
Park, Heemyong, Assaderaghi, Fariborz, Ajmera, Atul C, Shahidi, Ghavam G
Year of Publication 20.05.2003
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Year of Publication 20.05.2003
Patent