Application of medium energy nuclear microprobe to semiconductor process steps
Takai, Mikio, Kishimoto, Takehisa, Mimura, Ryou, Sawaragi, Hiroshi, Aihara, Ryuso
Published in Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms (01.09.1996)
Published in Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms (01.09.1996)
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Design of a 200 kV Focused Ion Beam Surface Analysis System
Mimura, Ryoh, Sawaragi, Hiroshi, Takai, Ryuso Aihara
Published in Japanese Journal of Applied Physics (01.12.1992)
Published in Japanese Journal of Applied Physics (01.12.1992)
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Distribution profiles and annealing characteristics of defects in GaAs induced by low-energy FIB irradiation
MIYAKE, H, YUBA, Y, GAMO, K, NAMBA, S, MIMURA, R, AIHARA, R
Published in Japanese Journal of Applied Physics (01.11.1988)
Published in Japanese Journal of Applied Physics (01.11.1988)
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200 kV mass-separated fine focused ion beam apparatus
SHIOKOWA, T, PIL HYON KIM, TOYODA, K, NAMBA, S, GAMO, K, AIHARA, R, ANAZAWA, N
Published in Japanese Journal of Applied Physics (01.07.1985)
Published in Japanese Journal of Applied Physics (01.07.1985)
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Performance of a Focused-Ion-Beam Implanter with Tilt-Writing Function
Sawaragi, Hiroshi, Manabe, Hironobu, Kasahara, Haruo, Aihara, Ryuso, Nakamura, Kazuo, Nihei, Fumiyuki, Ochiai, Yukinori, Matsui, Shinji, Nozaki, Tadatoshi
Published in Japanese Journal of Applied Physics (01.10.1989)
Published in Japanese Journal of Applied Physics (01.10.1989)
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