Ultraprecision CMP for sapphire, GaN, and SiC for advanced optoelectronics materials
Aida, Hideo, Doi, Toshiro, Takeda, Hidetoshi, Katakura, Haruji, Kim, Seong-Woo, Koyama, Koji, Yamazaki, Tsutomu, Uneda, Michio
Published in Current applied physics (01.09.2012)
Published in Current applied physics (01.09.2012)
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Journal Article
In-situ reflectance interferometry of heteroepitaxial diamond growth
Aida, Hideo, Oshima, Ryuji, Ouchi, Takaya, Kimura, Yutaka, Sawabe, Atsuhito
Published in Diamond and related materials (01.03.2021)
Published in Diamond and related materials (01.03.2021)
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Journal Article
Chemical Mechanical Polishing of MgO Substrate and Its Effect on Fabrication of Atomic Step-Terrace Structures on MgO Surface by Subsequent High-Temperature Annealing
Aida, Hideo, Ojima, Takumi, Oshima, Ryuji, Ihara, Takahiro, Takeda, Hidetoshi, Kimura, Yutaka, Sawabe, Atsuhito
Published in ECS journal of solid state science and technology (01.11.2022)
Published in ECS journal of solid state science and technology (01.11.2022)
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Journal Article
Challenges of future high-precision polishing methods for hard-to-process materials by the fusion of environmental control and plasma technology
K. Toshiro DOI, Hideo AIDA, Osamu OHNISHI, Shaohui YIN, Yinghui REN
Published in Jin gang shi yu mo liao mo ju gong cheng (01.12.2022)
Published in Jin gang shi yu mo liao mo ju gong cheng (01.12.2022)
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Journal Article
The Polishing Effect of SiC Substrates in Femtosecond Laser Irradiation Assisted Chemical Mechanical Polishing (CMP)
Wang, Chengwu, Kurokawa, Syuhei, Doi, Toshiro, Yuan, Julong, Sano, Yasuhisa, Aida, Hideo, Zhang, Kehua, Deng, Qianfa
Published in ECS journal of solid state science and technology (01.01.2017)
Published in ECS journal of solid state science and technology (01.01.2017)
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Journal Article
Overgrowth of diamond layers on diamond microneedles: New concept for freestanding diamond substrate by heteroepitaxy
Aida, Hideo, Ikejiri, Kenjiro, Kim, Seong-Woo, Koyama, Koji, Kawamata, Yuki, Kodama, Hideyuki, Sawabe, Atsuhito
Published in Diamond and related materials (01.06.2016)
Published in Diamond and related materials (01.06.2016)
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Journal Article
Microneedle growth method as an innovative approach for growing freestanding single crystal diamond substrate: Detailed study on the growth scheme of continuous diamond layers on diamond microneedles
Aida, Hideo, Kim, Seong-Woo, Ikejiri, Kenjiro, Fujii, Daiki, Kawamata, Yuki, Koyama, Koji, Kodama, Hideyuki, Sawabe, Atsuhito
Published in Diamond and related materials (01.05.2017)
Published in Diamond and related materials (01.05.2017)
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Journal Article
Control of initial bow of sapphire substrates for III-nitride epitaxy by internally focused laser processing
Aida, Hideo, Aota, Natsuko, Takeda, Hidetoshi, Koyama, Koji
Published in Journal of crystal growth (15.12.2012)
Published in Journal of crystal growth (15.12.2012)
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Journal Article
Relationships between Contact Image Analysis Results for Pad Surface Texture and Removal Rate in CMP
Uneda, Michio, Maeda, Yuki, Ishikawa, Ken-ichi, Ichikawa, Koichiro, Doi, Toshiro, Yamazaki, Tsutomu, Aida, Hideo
Published in Journal of the Electrochemical Society (01.01.2012)
Published in Journal of the Electrochemical Society (01.01.2012)
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Journal Article
Growth of thick GaN layers on laser-processed sapphire substrate by hydride vapor phase epitaxy
Koyama, Koji, Aida, Hideo, Kim, Seong-Woo, Ikejiri, Kenjiro, Doi, Toshiro, Yamazaki, Tsutomu
Published in Journal of crystal growth (01.10.2014)
Published in Journal of crystal growth (01.10.2014)
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Journal Article
Conference Proceeding
Patterned Sapphire Substrates for III-Nitride Epitaxial Growth
Omiya, Natsuko, Aida, Hideo, Kimura, Yutaka, Kawamata, Yuki, Kim, Seong-Woo, Uneda, Michio
Published in International journal of automation technology (05.03.2018)
Published in International journal of automation technology (05.03.2018)
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Journal Article
Surface Planarization of GaN-on-Sapphire Template by Chemical Mechanical Polishing for Subsequent GaN Homoepitaxy
Aida, Hideo, Kim, Seong-woo, Suzuki, Toshimasa, Koyama, Koji, Aota, Natsuko, Doi, Toshiro, Yamazaki, Tsutomu
Published in ECS journal of solid state science and technology (01.01.2014)
Published in ECS journal of solid state science and technology (01.01.2014)
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Journal Article
Investigation into Chemical Mechanical Polishing Mechanism of Hard-to-Process Materials Using a Commercially Available Single-Sided Polisher
Uneda, Michio, Takano, Keiichi, Koyama, Koji, Aida, Hideo, Ishikawa, Ken-ichi
Published in International journal of automation technology (05.09.2015)
Published in International journal of automation technology (05.09.2015)
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Journal Article
Analysis of sapphire- chemical mechanical polishing using digital image processing
UNEDA, Michio, TAKANO, Keiichi, KOYAMA, Koji, AIDA, Hideo, ISHIKAWA, Ken-ichi
Published in Mechanical Engineering Journal (01.01.2016)
Published in Mechanical Engineering Journal (01.01.2016)
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Journal Article