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Year of Publication 14.09.2004
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Method for forming a gate electrode having a metal
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Year of Publication 18.04.2006
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A first inter-layer dielectric stack for non-volatile memory
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Year of Publication 04.07.2012
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Method for forming a layer using a purging gas in a semiconductor process
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Year of Publication 21.03.2006
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Method for forming a layer using a purging gas in a semiconductor process
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Year of Publication 21.03.2006
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Year of Publication 21.03.2006
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METHOD FOR FORMING A GATE ELECTRODE HAVING A METAL
YU, KATHLEEN C, ADETUTU, OLUBUNMI O, JONES JR., ROBERT E, MICHAELSON, LYNNE M
Year of Publication 10.11.2005
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Year of Publication 10.11.2005
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Low RC product transistors in SOI semiconductor process
THEAN VOON-YEW, WHITE TED R, NGUYEN BICH-YEN, ADETUTU OLUBUNMI O, BARR ALEXANDER L, ORLOWSKI MARIUS K, SADAKA MARIAM G
Year of Publication 02.05.2006
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Year of Publication 02.05.2006
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Low RC product transistors in SOI semiconductor process
Barr, Alexander L, Adetutu, Olubunmi O, Nguyen, Bich-Yen, Orlowski, Marius K, Sadaka, Mariam G, Thean, Voon-Yew, White, Ted R
Year of Publication 02.05.2006
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Year of Publication 02.05.2006
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LOW RC PRODUCT TRANSISTORS IN SOI SEMICONDUCTOR PROCESS
THEAN VOON-YEW, WHITE TED R, NGUYEN BICH-YEN, ADETUTU OLUBUNMI O, BARR ALEXANDER L, ORLOWSKI MARIUS K, SADAKA MARIAM G
Year of Publication 20.04.2006
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Year of Publication 20.04.2006
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Process for forming a high-K gate dielectric
NGUYEN BICH-YEN, HOBBS CHRISTOPHER C, ADETUTU OLUBUNMI O, KAUSHIK VIDYA S
Year of Publication 06.02.2001
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Year of Publication 06.02.2001
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A first inter-layer dielectric stack for non-volatile memory
INGERSOLL PAUL A, HUNDLEY CHRISTOPHER B, SWIFT CRAIG T, ADETUTU OLUBUNMI O
Year of Publication 10.02.2010
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Year of Publication 10.02.2010
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