TECHNIQUE FOR MEASURING OVERLAY BETWEEN LAYERS OF A MULTILAYER STRUCTURE
GOLDMAN RAN, ZAUER ITAY, WEINBERG YAKOV, LEVI SHIMON, SCHWARZBAND ISHAI, NOVAK OLGA, RATHORE DHANANJAY SINGH, KRIS ROMAN, ADAN OFER
Year of Publication 05.04.2022
Get full text
Year of Publication 05.04.2022
Patent
기판을 이동시키기 위한 방법 및 시스템
AVNERI ISRAEL, KHASGIWALE NIRANJAN RAMCHANDRA, UZIEL YORAM, KRIVTS (KRAYVITZ) IGOR, ADAN OFER
Year of Publication 12.03.2020
Get full text
Year of Publication 12.03.2020
Patent
다층 구조물의 층들 사이의 오버레이를 측정하기 위한 기법
GOLDMAN RAN, ZAUER ITAY, WEINBERG YAKOV, LEVI SHIMON, SCHWARZBAND ISHAI, NOVAK OLGA, RATHORE DHANANJAY SINGH, KRIS ROMAN, ADAN OFER
Year of Publication 28.02.2018
Get full text
Year of Publication 28.02.2018
Patent
AN EVALUATION SYSTEM AND A METHOD FOR EVALUATING A SUBSTRATE
UZIEL YORAM, KORNGUT DORON, BAR OR RON, SHNEYOUR OFER, FELDMAN HAIM, NAFTALI RON, ADAN OFER
Year of Publication 05.02.2016
Get full text
Year of Publication 05.02.2016
Patent
CD metrology for EUV lithography and etch
Johanesen, Hayley, Kenslea, Anne, Williamson, Mark, Knowles, Matt, Kwakman, Laurens, Levi, Shimon, Nishry, Noam, Adan, Ofer, Englard, Ilan, Van Puymbroeck, Jan, Felder, Dan, Gov, Shahar, Cohen, Oded, Turovets, Igor
Published in 2015 26th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC) (01.05.2015)
Published in 2015 26th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC) (01.05.2015)
Get full text
Conference Proceeding
CD-SEM metrology evaluation of gate-all-around Si nanowire MOSFET with improved control of nanowire suspension by using a buried boron nitride etch-stop layer
Cohen, Guy M., Shi, Leathen, Bangsaruntip, Sarunya, Grill, Alfred, Neumayer, Deborah, Levi, Shimon, Weinberg, Yakov, Shoval, Ori, Adan, Ofer, Tzi, Maayan Bar, Conley, Amiad
Published in 25th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC 2014) (01.05.2014)
Published in 25th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC 2014) (01.05.2014)
Get full text
Conference Proceeding
Phenomenology of ArF photoresist shrinkage trends
Bunday, Benjamin, Cordes, Aaron, Allgair, John, Piscani, Emil, Rice, Bryan J., Avitan, Yohanan, Peltinov, Ram, Adan, Ofer
Published in 2008 International Symposium on Semiconductor Manufacturing (ISSM) (01.10.2008)
Get full text
Published in 2008 International Symposium on Semiconductor Manufacturing (ISSM) (01.10.2008)
Conference Proceeding