Fast mask near-field calculation using fully convolution network
Lin, Jiaxin, Dong, Lisong, Fan, Taian, Ma, Xu, Chen, Rui, Wei, Yayi
Published in 2020 International Workshop on Advanced Patterning Solutions (IWAPS) (05.11.2020)
Published in 2020 International Workshop on Advanced Patterning Solutions (IWAPS) (05.11.2020)
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Conference Proceeding
An effective method of contour extraction for SEM image based on DCNN
Zhou, Tao, Shi, Xuelong, YanYan, Li, Chen, Chen, Shoumian, Zhao, Yuhang, Zhou, Wenzhan, Zhou, Kan, Zeng, Xuan
Published in 2020 International Workshop on Advanced Patterning Solutions (IWAPS) (05.11.2020)
Published in 2020 International Workshop on Advanced Patterning Solutions (IWAPS) (05.11.2020)
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Conference Proceeding
Machine Learning Hotspot Prediction Significantly Improve Capture Rate on Wafer
Yuan, Wei, Lu, Yifei, Li, Ming, Pan, Bingyang, Gao, Ying, Tian, Yu, Li, Zhi-qin, Ji, Liang, Huang, Ying, Chen, Hao, Yao, Yueliang, Park, Sean
Published in 2020 International Workshop on Advanced Patterning Solutions (IWAPS) (05.11.2020)
Published in 2020 International Workshop on Advanced Patterning Solutions (IWAPS) (05.11.2020)
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Conference Proceeding
Reducing Systematic Defects using Calibre Wafer Defect Engineering and Machine Learning Solutions
Jiang, Jet, Hou, Frank, Li, Gavin, Chen, Summy, Fei, Marfei, Xie, Qian, Cao, Liang, Wan, Qijian, Hu, Xinyi, Du, Chunshan, Wang, David, Huang, Elven, Paninjath, Sankaranarayanan, Madhusudhan, Saikiran, Tian, Leo
Published in 2020 International Workshop on Advanced Patterning Solutions (IWAPS) (05.11.2020)
Published in 2020 International Workshop on Advanced Patterning Solutions (IWAPS) (05.11.2020)
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Conference Proceeding
The impact of lenses aberration on CD and position for low kl lithography
Li, Tie, Lai, Hsuan-Cheng, Xu, Jie, Meng, Xiaodong
Published in 2020 International Workshop on Advanced Patterning Solutions (IWAPS) (05.11.2020)
Published in 2020 International Workshop on Advanced Patterning Solutions (IWAPS) (05.11.2020)
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Conference Proceeding
Real time process monitoring using diffraction-based overlay measurements from YieldStar
Chen, Henry, Chang, Jimmy, Tsao, Sheng-Tsung, Zhang, Junjun, Du, Jie, Fan, Congcong, Huang, Alex, Xu, David, Liu, Sam, Wu, Liang, Yang, Kimi, Gu, Ning, Ren, Liping, Wu, Jian, Tan, Alexander, Xia, Sunny, Mao, Ivan
Published in 2020 International Workshop on Advanced Patterning Solutions (IWAPS) (05.11.2020)
Published in 2020 International Workshop on Advanced Patterning Solutions (IWAPS) (05.11.2020)
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Conference Proceeding
Fast and Accurate Machine Learning Inverse Lithography Using Physics Based Feature Maps and Specially Designed DCNN
Shi, Xuelong, Yan, Yan, Zhou, Tao, Yu, Xueru, Li, Chen, Chen, Shoumian, Zhao, Yuhang
Published in 2020 International Workshop on Advanced Patterning Solutions (IWAPS) (05.11.2020)
Published in 2020 International Workshop on Advanced Patterning Solutions (IWAPS) (05.11.2020)
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Conference Proceeding
Photoresist for Extreme Ultraviolet Lithography
Tao, Peipei, Sheng, Li, Wang, Qianqian, Cui, Hao, Wang, Xiaolin, He, Xiangming, Xu, Hong
Published in 2020 International Workshop on Advanced Patterning Solutions (IWAPS) (05.11.2020)
Published in 2020 International Workshop on Advanced Patterning Solutions (IWAPS) (05.11.2020)
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Conference Proceeding
Evaluating the Process Performances of Binary, PSM and OMOG Masks in Advanced Technology Node
Xie, Weimei, Chen, Yanpeng, Yu, Shirui, Zhang, Yu
Published in 2020 International Workshop on Advanced Patterning Solutions (IWAPS) (05.11.2020)
Published in 2020 International Workshop on Advanced Patterning Solutions (IWAPS) (05.11.2020)
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Conference Proceeding
Source Optimization under Thick Mask Model
Liu, Yang, Sun, Yiyu, Li, Yanqiu, Wei, Pengzhi, Liu, Lihui, Li, Enze
Published in 2020 International Workshop on Advanced Patterning Solutions (IWAPS) (05.11.2020)
Published in 2020 International Workshop on Advanced Patterning Solutions (IWAPS) (05.11.2020)
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Conference Proceeding
Mask Optimization based on artificial desired pattern
Peng, Fei, Gui, Chengqun, Song, Yi, Shen, Yijiang
Published in 2020 International Workshop on Advanced Patterning Solutions (IWAPS) (05.11.2020)
Published in 2020 International Workshop on Advanced Patterning Solutions (IWAPS) (05.11.2020)
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Conference Proceeding
Modified Anti-windup Control for High Precision Motion System
Wu, Zhipeng, Ding, Minxia, Li, Jing
Published in 2020 International Workshop on Advanced Patterning Solutions (IWAPS) (05.11.2020)
Published in 2020 International Workshop on Advanced Patterning Solutions (IWAPS) (05.11.2020)
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Conference Proceeding
Machine Learning Virtual SEM Metrology
Yan, Yan, Shi, Xuelong, Zhou, Tao, Xu, Bowen, Li, Chen, Lu, Yifei, Gao, Ying
Published in 2020 International Workshop on Advanced Patterning Solutions (IWAPS) (05.11.2020)
Published in 2020 International Workshop on Advanced Patterning Solutions (IWAPS) (05.11.2020)
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Conference Proceeding
A novel SEM image based advanced lithography process control providing quick feedback
Fan, Xuedong, Chen, Lijun, Zhu, Jun, Zheng, Haichang, Wang, Xiaolong, Ge, Yancong, Zhang, Yu, Vikram, Abhishek, Cheng, Guojie, Wang, Hui, Zhang, Qing, Liao, Wenkui
Published in 2020 International Workshop on Advanced Patterning Solutions (IWAPS) (05.11.2020)
Published in 2020 International Workshop on Advanced Patterning Solutions (IWAPS) (05.11.2020)
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Conference Proceeding
Overlay mark sub structure design to improve the contrast
Zhang, Libin, Lu, Cong, Feng, Yaobin, Wei, Yayi, Su, Xiaojing, Ma, Le, Dong, Lisong
Published in 2020 International Workshop on Advanced Patterning Solutions (IWAPS) (05.11.2020)
Published in 2020 International Workshop on Advanced Patterning Solutions (IWAPS) (05.11.2020)
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Conference Proceeding
OPO Measurement Improvement in Advanced DRAM with Tunable Wavelength Imaging
Xia, Yunsheng, Qin, Rui, Lan, Andy, Huang, Joer, Fan, Congcong, Qiu, Shaowen, Xue, Dong, Tao, Dashuai, Gao, Kun, Li, Haoran, Lu, Shu, Su, Hongpeng, Gao, Linfei, Song, Jinyan
Published in 2020 International Workshop on Advanced Patterning Solutions (IWAPS) (05.11.2020)
Published in 2020 International Workshop on Advanced Patterning Solutions (IWAPS) (05.11.2020)
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Conference Proceeding
Preliminary Round of OPC Development in 180nm node Silicon Photonics MPW platform
Huang, Zengzhi, Zheng, Zhenguo, Chen, Shijie, Feng, Junbo, Huang, Weiran, Cao, Guowei
Published in 2020 International Workshop on Advanced Patterning Solutions (IWAPS) (05.11.2020)
Published in 2020 International Workshop on Advanced Patterning Solutions (IWAPS) (05.11.2020)
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Conference Proceeding
An application of Chebyshev spectral method in modeling the diffusion of the acid during PEB process
Kong, Pengjie, Dona, Lisong, Wei, Yayi
Published in 2020 International Workshop on Advanced Patterning Solutions (IWAPS) (05.11.2020)
Published in 2020 International Workshop on Advanced Patterning Solutions (IWAPS) (05.11.2020)
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Conference Proceeding
Investigation of A New Method to Weigh the Data Used for OPC Model Calibration
Ma, Le, Zhang, Libin, Yue, Liwan, Mao, Zhibiao, Wei, Yayi, Dong, Lisong
Published in 2020 International Workshop on Advanced Patterning Solutions (IWAPS) (05.11.2020)
Published in 2020 International Workshop on Advanced Patterning Solutions (IWAPS) (05.11.2020)
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Conference Proceeding