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Simulations of Scatterometry Down to 22 nm Structure Sizes and Beyond with Special Emphasis on LER
Osten, W, Ferreras Paz, V, Frenner, K, Schuster, T, Bloess, H
Published in 2009 International Conference on Frontiers of Characterization and Metrology for Nanoelectronics (01.01.2009)
Published in 2009 International Conference on Frontiers of Characterization and Metrology for Nanoelectronics (01.01.2009)
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Quantifying and enforcing two-dimensional symmetries in scanning probe microscopy images
Moeck, Peter, Loader, Marius, Abdel-Hafiez, Mahmoud, Hietschold, Michael
Published in 2009 International Conference on Frontiers of Characterization and Metrology for Nanoelectronics (01.01.2009)
Published in 2009 International Conference on Frontiers of Characterization and Metrology for Nanoelectronics (01.01.2009)
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Modeling artifacts in the analysis of test semiconductor structures in atom probe tomography
Vurpillot, F, Gruber, M, Duguay, S, Cadel, E, Deconihout, B
Published in 2009 International Conference on Frontiers of Characterization and Metrology for Nanoelectronics (01.01.2009)
Published in 2009 International Conference on Frontiers of Characterization and Metrology for Nanoelectronics (01.01.2009)
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Effects of Experimental Parameters on the Work Function Measurement: A Kelvin Force Microscopy Study
Kaja, K, Chevalier, N, Mariolle, D, Bertin, F, Feuillet, G, Chabli, A
Published in 2009 International Conference on Frontiers of Characterization and Metrology for Nanoelectronics (01.01.2009)
Published in 2009 International Conference on Frontiers of Characterization and Metrology for Nanoelectronics (01.01.2009)
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Aberration-corrected Electron Microscopy Imaging for Nanoelectronics Applications
Kisielowski, C, Specht, P, Alloyeau, D, Erni, R, Ramasse, Q
Published in AIP conference proceedings (01.01.2009)
Published in AIP conference proceedings (01.01.2009)
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Towards Routine Backside SIMS Sample Preparation for Efficient Support of Advanced IC Process Development
Hopstaken, M J P, Cabral Jr, C, Pfeiffer, D, Molella, C, Ronsheim, P
Published in 2009 International Conference on Frontiers of Characterization and Metrology for Nanoelectronics (01.01.2009)
Published in 2009 International Conference on Frontiers of Characterization and Metrology for Nanoelectronics (01.01.2009)
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Characterization of Organic Contamination in Semiconductor Manufacturing Processes
Nutsch, A, Beckhoff, B, Bedana, G, Borionetti, G, Codegoni, D, Grasso, S, Guerinoni, G, Leibold, A, Muller, M, Otto, M, Pfitzner, L, Polignano, M-L, De Simone, D, Frey, L
Published in 2009 International Conference on Frontiers of Characterization and Metrology for Nanoelectronics (01.01.2009)
Published in 2009 International Conference on Frontiers of Characterization and Metrology for Nanoelectronics (01.01.2009)
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Boron Nanowires for Flexible Electronics and Field Emission
Tian, Jifa, Cai, Jinming, Hui, Chao, Li, Chen, Tian, Yuan, Shen, Chengmin, Gao, Hongjun
Published in 2009 International Conference on Frontiers of Characterization and Metrology for Nanoelectronics (15.05.2009)
Published in 2009 International Conference on Frontiers of Characterization and Metrology for Nanoelectronics (15.05.2009)
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Multi-technique characterization of arsenic ultra shallow junctions in silicon within the ANNA consortium
Giubertoni, D, Pepponi, G, Beckhoff, B, Hoenicke, P, Gennaro, S, Meirer, F, Ingerle, D, Steinhauser, G, Fried, M, Petrik, P, Parisini, A, Reading, M A, Streli, C, Van Den Berg, J A, Bersani, M
Published in 2009 International Conference on Frontiers of Characterization and Metrology for Nanoelectronics (01.01.2009)
Published in 2009 International Conference on Frontiers of Characterization and Metrology for Nanoelectronics (01.01.2009)
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Correction of Hysteresis in SPM Images by a Moving Window Correlation Method
Fu, Joseph, Chu, Wei, Dixson, Ronald, Orji, George, Vorburger, Theodore
Published in 2009 International Conference on Frontiers of Characterization and Metrology for Nanoelectronics (01.01.2009)
Published in 2009 International Conference on Frontiers of Characterization and Metrology for Nanoelectronics (01.01.2009)
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Temperature-Programmed Gas-Sensing With Microhotplates: an Opportunity to Enhance Microelectronic Gas Sensor Metrology
Geist, Jon, Afridi, Muhammad
Published in 2009 International Conference on Frontiers of Characterization and Metrology for Nanoelectronics (01.01.2009)
Published in 2009 International Conference on Frontiers of Characterization and Metrology for Nanoelectronics (01.01.2009)
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