Reduction of plasma process-induced damage during gate poly etching by using a SiO/sub 2/ hard mask
Lee, H.C., Creusen, M., Groeseneken, G., Vanhaelemeersch, S.
Published in 1998 3rd International Symposium on Plasma Process-Induced Damage (Cat. No.98EX100) (1998)
Published in 1998 3rd International Symposium on Plasma Process-Induced Damage (Cat. No.98EX100) (1998)
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Conference Proceeding
Effect of electron temperature and electron density on topography dependent charging (TDC) damage in inductively coupled plasma etching tool
Tokashiki, K., Araki, M., Nagase, M., Noguchi, K., Miyamoto, H., Horiuchi, T.
Published in 1998 3rd International Symposium on Plasma Process-Induced Damage (Cat. No.98EX100) (1998)
Published in 1998 3rd International Symposium on Plasma Process-Induced Damage (Cat. No.98EX100) (1998)
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Conference Proceeding
Charging damage in thin gate-oxides-better or worse?
Cheung, K.P., Liu, C.-T., Chang, C.-P., Colonell, J.I., Lai, W.-Y.-C., Pai, C.-S., Vaidya, H., Liu, R., Clemens, J.T., Hasegawa, E.
Published in 1998 3rd International Symposium on Plasma Process-Induced Damage (Cat. No.98EX100) (1998)
Published in 1998 3rd International Symposium on Plasma Process-Induced Damage (Cat. No.98EX100) (1998)
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Conference Proceeding
Relation between product yield and plasma process induced damage
Luchies, J.-M., Simon, P., Kuper, F., Maly, W.
Published in 1998 3rd International Symposium on Plasma Process-Induced Damage (Cat. No.98EX100) (1998)
Published in 1998 3rd International Symposium on Plasma Process-Induced Damage (Cat. No.98EX100) (1998)
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Conference Proceeding
Calculating plasma damage as a function of gate oxide thickness
Linder, B.P., Cheung, N.W.
Published in 1998 3rd International Symposium on Plasma Process-Induced Damage (Cat. No.98EX100) (1998)
Published in 1998 3rd International Symposium on Plasma Process-Induced Damage (Cat. No.98EX100) (1998)
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Conference Proceeding
The effect of plasma damage and different annealing ambients on the generation of latent interface states
Creusen, M., Lee, H.-C., Vanhaelemeersch, S., Groeseneken, G.
Published in 1998 3rd International Symposium on Plasma Process-Induced Damage (Cat. No.98EX100) (1998)
Published in 1998 3rd International Symposium on Plasma Process-Induced Damage (Cat. No.98EX100) (1998)
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Conference Proceeding
Is surface potential measurement (SPM) a useful charging damage measurement method?
Cheung, K.P., Colonell, J.I., Steiner, K.G., Shive, S., Kook, T., Chang, C.-P., Lai, W.-Y.-C., Liu, C.-T., Liu, R., Pai, C.-S., Vaidya, H., Clemens, J.T.
Published in 1998 3rd International Symposium on Plasma Process-Induced Damage (Cat. No.98EX100) (1998)
Published in 1998 3rd International Symposium on Plasma Process-Induced Damage (Cat. No.98EX100) (1998)
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Conference Proceeding
Charging damage in metal-oxide-metal capacitors
Harris, E.B., Gregor, R.W., Dennis, D.C., Lai, T.T., Sen, S., Yan, Y.F., Esry, T., Pita, M.
Published in 1998 3rd International Symposium on Plasma Process-Induced Damage (Cat. No.98EX100) (1998)
Published in 1998 3rd International Symposium on Plasma Process-Induced Damage (Cat. No.98EX100) (1998)
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Conference Proceeding
Stress-induced leakage current due to charging damage: gate oxide thickness and gate poly-Si etching condition dependence
Park, D., Kennard, M., Melaku, Y., Benjamin, N., King, T.-J., Hu, C.
Published in 1998 3rd International Symposium on Plasma Process-Induced Damage (Cat. No.98EX100) (1998)
Published in 1998 3rd International Symposium on Plasma Process-Induced Damage (Cat. No.98EX100) (1998)
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Conference Proceeding