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Influence of oxidant passivation on controlling dishing in alkaline chemical mechanical planarization
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贾少华 刘玉岭 王辰伟 闫辰奇
Published in
Journal of semiconductors
(01.12.2015)
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Journal Article
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engineering
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physics
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Topic
alkaline
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bulging
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cu cmp
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dishing
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electrolytes
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h2o2
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English
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IOP_英国物理学会现刊（含NSTL购买的14种刊）
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