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Stress and resistivity controls on in situ boron doped LPCVD polysilicon films for high-Q MEMS applications
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解婧 刘云飞 杨晋玲 唐龙娟 杨富华
Published in
Journal of semiconductors
(01.08.2009)
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Journal Article
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engineering
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physics
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annealing
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film resistivity
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low pressure chemical vapor deposition
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mems谐振器
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microelectromechanical systems
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physical sciences
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IOP Electronic Journals
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