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深冷处理对不同碳含量WC?11Co硬质合金显微组织及性能的影响

深冷处理对不同碳含量WC?11Co硬质合金显微组织及性能的影响

by 谢晨辉, 黄继武, 唐云锋, 谷立宁
Published in 中国有色金属学报（英文版） (2015)

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Journal Article

深冷处理对不同碳含量WC-11Co硬质合金显微组织及性能的影响

深冷处理对不同碳含量WC-11Co硬质合金显微组织及性能的影响

by 谢晨辉黄继武唐云锋谷立宁
Published in 中国有色金属学报：英文版 (2015)

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TDDB characteristic and breakdown mechanism of ultra-thin SiO2/HfO2 bilayer gate dielectrics

TDDB characteristic and breakdown mechanism of ultra-thin SiO2/HfO2 bilayer gate dielectrics

by 陶芬芬杨红唐波唐兆云徐烨锋许静王卿璞闫江
Published in 半导体学报：英文版 (01.06.2014)

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Characterization of positive bias temperature instability of NMOSFET with high-k/metal gate last process

Characterization of positive bias temperature instability of NMOSFET with high-k/metal gate last process

by 任尚清杨红唐波徐昊罗维春唐兆云徐烨锋许静王大海李俊峰闫江赵超陈大鹏叶甜春王文武
Published in Journal of semiconductors (2015)

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Journal Article