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Controlled strong excitation of silicon as a step towards processing materials at sub-nanometer precision
Dinh, Thanh-Hung, Medvedev, Nikita, Ishino, Masahiko, Kitamura, Toshiyuki, Hasegawa, Noboru, Otobe, Tomohito, Higashiguchi, Takeshi, Sakaue, Kazuyuki, Washio, Masakazu, Hatano, Tadashi, Kon, Akira, Kubota, Yuya, Inubushi, Yuichi, Owada, Shigeki, Shibuya, Tatsunori, Ziaja, Beata, Nishikino, Masaharu
Published in Communications physics (28.11.2019)
Published in Communications physics (28.11.2019)
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Journal Article
Reactions of Phenolic Mannich Bases with Phenols
Azuma, Keiichi, Kitamura, Toshiyuki, Fukuzaki, Shigeo, Imoto, Eiji
Published in The Journal of the Society of Chemical Industry, Japan (1958)
Published in The Journal of the Society of Chemical Industry, Japan (1958)
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Journal Article