Decomposition of CF4 Exhaust Gas from Semiconductor Manufacturing Equipments Using Low Pressure Inductively Coupled Plasma: Optimization of Operating Conditions and Byproduct Analysis
KUROKI, Tomoyuki, SAEKI, Noboru, OKUBO, Masaaki, YAMAMOTO, Toshiaki
Published in Nihon Kikai Gakkai rombunshuu. B hen (2004)
Published in Nihon Kikai Gakkai rombunshuu. B hen (2004)
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